Far infrared reflecting laminate
A technology of far-infrared rays and reflective layers, applied in coatings, layered products, sputtering coatings, etc., can solve the problems of inability to exert protective performance, easy damage to the surface, insufficient friction resistance, etc., and achieve good far-infrared reflection performance Effect
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Embodiment 1
[0177] As the substrate 4 , a PET film (Tuftop (registered trademark) COT0 (100 μm thickness) manufactured by Toray Film Processing Co., Ltd.) having an acrylic hard coat layer (film thickness 3.3 μm) as the inner hard coat layer 3 was used.
[0178] On the inner hard coat layer 3 of this film, at reaching pressure: 8E-3Pa, Ag alloy target (56mm×106mm×1 piece: Ag-1 mass% Au), conveying speed: 0.3m / min, sputtering gas: Ar, sputtering pressure: 0.5Pa, input power: direct current (hereinafter sometimes abbreviated as DC) 105W, sputtering processing is performed to form a single-layer structure of metal containing 95 to 100% by mass of Ag. reflective layer 2.
[0179] Next, the surface hard coat layer 1 made of a phosphoric acid group-containing crosslinked resin is formed as follows. A methacrylic acid derivative containing a phosphoric acid group (Light ESTER P- 2M), the phosphoric acid group-containing methacrylic acid derivative was diluted to a solid content concentration o...
Embodiment 2
[0182] A sample was obtained in the same manner as in Example 1, except that the conveyance speed when forming the far-infrared reflective layer of the single-layer structure of a metal containing 95 to 100% by mass of Ag was set to 0.8 m / min. The results are shown in Table 1 and Table 3.
[0183] In the step of forming the far-infrared reflection layer, the surface resistance of the far-infrared reflection layer was measured and found to be 7Ω / □. In addition, the film thickness was analyzed using a high-speed spectroscopic ellipsometer at the above-mentioned stage. As a result, the film thickness of the inner hard coat layer laminated on Tuftop (registered trademark) COT0 manufactured by Toray Film Processing Co., Ltd. was 3.3 μm, and the far-infrared reflection The film thickness of the layer was 12.1 nm. The film thickness of the surface hard coat layer was 0.8 μm. The far-infrared reflectance is 88%, the surface friction resistance is 3 strands / 10mm, and the visible ligh...
Embodiment 3
[0185]A far-infrared reflective layer of a multilayer structure comprising a metal layer containing 95 to 100% by mass of Ag and a high-refractive index layer containing metal oxide and a refractive index of 1.5 to 3 is formed as the far-infrared reflective layer as follows , except that, a sample was obtained in the same manner as in Example 1.
[0186] (Method for forming far-infrared reflective layer)
[0187] At reaching pressure: 2E-3Pa, Ag alloy target (76mm×330mm×2 pieces: Ag-0.2 mass% Nd-1 mass% Au), transport speed: 3.5m / min, sputtering gas: Ar, sputtering pressure: 9.5E-2Pa, input power: under the condition of LF power supply (40kHz) 1.0kw, after the metal layer is formed by sputtering, the reaching pressure: below 2E-3Pa, ITO target (127mm×386mm×1 piece: 90% by mass) In 2 o 3 -10% by mass SnO 2 ), transfer speed: 0.9m / min, sputtering gas: Ar-3vol%O 2 1. Sputtering pressure: 9.5E-2Pa, input power: DC pulse (50kHz) 2.5kw, the ITO layer was formed by sputtering. ...
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