Device capable of generating uniform linear laser beams based on high-numerical aperture cylindrical lens focusing

A high numerical aperture, cylindrical lens technology, applied in optics, optical components, instruments, etc., can solve the problems of the complex structure of the beam shaping system and the high price of aspheric lenses, and achieve the effect of simple structure

Inactive Publication Date: 2013-10-02
NORTHWEST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Usually, in order to obtain a flat-top uniform line laser beam, the beam shaping syste

Method used

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  • Device capable of generating uniform linear laser beams based on high-numerical aperture cylindrical lens focusing
  • Device capable of generating uniform linear laser beams based on high-numerical aperture cylindrical lens focusing
  • Device capable of generating uniform linear laser beams based on high-numerical aperture cylindrical lens focusing

Examples

Experimental program
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Effect test

Embodiment 1

[0015] Such as figure 1 As shown, this embodiment provides a device based on high numerical aperture cylindrical lens focusing to generate a uniform line laser beam, which consists of a linearly polarized laser light source 1, a ball lens group 2, a rectangular diaphragm 3, a half-wave plate 4 and Composed of 6 high numerical aperture cylindrical lenses;

[0016] The light beam generated by the linearly polarized laser light source 1 is expanded and collimated by the ball lens group 2, and the almost uniform rectangular linearly polarized light in the center of the light spot is selected by the rectangular diaphragm 3 to pass through; the rectangular linearly polarized light emitted from the rectangular diaphragm 3 passes through two After the one-third wave plate 4 is focused by a high numerical aperture cylindrical lens 6, a uniform line laser beam is generated at the focal plane.

[0017] In this embodiment, the linearly polarized laser light source 1 is a gas laser light ...

Embodiment 2

[0037] Such as figure 1 As shown, a discontinuous wave plate 5 is added in the optical path shown in embodiment 1, and the rectangular linearly polarized light is converted into a rectangular TEM 01 Linearly polarized light, rectangular TEM 01 The linearly polarized light is focused on the focal plane 7 by an aplanatic high numerical aperture cylindrical lens 6, and other conditions of this embodiment are the same as those of Embodiment 1.

[0038] In this embodiment, there is a specific height difference between the two halves of the discontinuous wave plate 5, so that a relative phase difference of π is generated between the two halves of the beam, thereby converting rectangular linearly polarized light into a rectangular TEM 01 linearly polarized light; and the dividing line between the two halves of the discontinuous wave plate 5 is parallel to the x-axis. The structure diagram of the discontinuous wave plate 5 is as image 3 shown.

[0039] Rectangular TEM 01 The lin...

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Abstract

The invention relates to a device capable of generating uniform linear laser beams based on high-numerical aperture cylindrical lens focusing. The device is composed of a linear polarization laser light source, a spherical lens assembly, a rectangular aperture, a 1/2 wave plate, a discontinuous wave plate and a high-numerical aperture cylindrical lens. Light beams generated by the linear polarization laser light source are subjected to beam expansion and collimation which are performed by the spherical lens assembly, and then, rectangular linearly polarized light which is almost uniform and is arranged at the center of a light spot selectively passes through the rectangular aperture; the rectangular linearly polarized light emitted by the rectangular aperture passes through the 1/2 wave plate, and then, passes through or does not pass through the discontinuous wave plate; and after that, the rectangular linearly polarized light is focused by the high-numerical aperture cylindrical lens, and the uniform linear laser beams are generated at a focal plane. With the device which is of structural simplicity adopted, under the situations that the discontinuous wave plate is used or not used, the uniform linear laser beams of which the center is flat-topped can be obtained at the focal plane through simply rotating the 1/2 wave plate and changing the numerical aperture of the high-numerical aperture cylindrical lens, wherein the uniform linear laser beams can be used for linear scanning microscopic imaging, and micro-nano materials processing and detection.

Description

technical field [0001] The invention belongs to the field of laser beam shaping, and in particular relates to a device for generating uniform line laser beams based on high numerical aperture cylindrical lens focusing. Background technique [0002] Uniform line illumination has broad application prospects in the fields of on-line scanning microscopy imaging, micro-nano material processing and detection. In order to meet the requirements of the above-mentioned use, the uniform line illumination produced needs to have strong light intensity, good light intensity uniformity and extremely fine size. The uniform line illumination obtained by beam shaping of traditional natural light sources is difficult to meet the above requirements at the same time. With the emergence of high-brightness laser light sources, uniform line illumination that meets the requirements can be obtained by optically shaping the laser beam. Usually, in order to obtain a flat-top uniform line laser beam, t...

Claims

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Application Information

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IPC IPC(8): G02B27/09G02B27/28
Inventor 陈小明白晋涛
Owner NORTHWEST UNIV
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