Exhaust gas purification device and exhaust gas purification method using the same
An exhaust purification device and exhaust purification technology are applied in the direction of electric control of exhaust treatment devices, exhaust devices, chemical instruments and methods, etc., which can solve the cost-effectiveness of exhaust purification devices (insufficient cost, cannot fully prevent Particulate matter purification ability, no practical application and other problems have been found, to achieve high particle matter oxidation ability and the effect of inhibiting the decline of particulate matter oxidation ability
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Embodiment 1
[0096]
[0097] Ion-exchanged water was added to calcium sulfate hemihydrate (calcined gypsum, manufactured by Wako Pure Chemical Industries Co., Ltd.), and a slurry containing calcium sulfate particles having a secondary particle average diameter of 0.6 μm was formed by grinding in a ball mill. Then, a commercially available DPF (diameter 30 mm, length 50 mm, porosity 60%, average pore diameter 30 μm, produced by NipponGaishi Co., Ltd.) made of cordierite was prepared, and the slurry was impregnated therein so as to enter the partition pores of the DPF (partitionwallpore). Then, excess slurry was removed from the DPF impregnated with the slurry by using a suction device, followed by drying at 110° C. for 16 hours, and then calcining at 500° C. for 3 hours. Such calcination can convert calcium sulfate hemihydrate to calcium sulfate (anhydrous), and thus can strongly load (attach) calcium sulfate (anhydrous) on the DPF. When calcium sulfate (anhydrous) was thus supported on ...
Embodiment 2
[0114] In the same manner as in Example 1, the exhaust gas purification device provided with the oxidation catalyst was determined to be The 50% PM oxidation temperature before and after the ash deposition treatment in (in this example, model gases A and B simulate exhaust gas in which an oxidation catalyst is arranged in its flow path). Therefore, preparation of an oxidation catalyst, concentrated gas supply treatment, PM attachment treatment (I), PM purification treatment (I), ash deposition treatment, concentrated gas supply treatment, PM attachment treatment (II) were carried out in the order described in Example 2. ) and PM purification treatment (II). exist Figure 5 The results relating to the resulting 50% PM oxidation temperature are shown in .
[0115]
[0116] The rich atmosphere model gas B (gas model with a rich air-fuel ratio) as shown in Table 2 was supplied to the oxidation catalyst for 12 minutes under the conditions of an inlet gas temperature of 400° C. ...
Embodiment 3
[0120] Except that the inlet gas temperature at the oxidation catalyst for model gas B was changed from 400°C to 500°C in the rich gas supply process, it was determined in the exhaust purification device provided with the oxidation catalyst in the same manner as in Example 2 The 50% PM oxidation temperature before and after the ash deposition treatment. exist Figure 5 The results relating to the resulting 50% PM oxidation temperature are shown in .
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