Electrostatic-adhered heat-insulating film and manufacturing method thereof

A technology of electrostatic adhesion and manufacturing method, applied in the direction of chemical instruments and methods, synthetic resin layered products, layered products, etc., can solve the problems of brightness reduction and blocking in the interior space of commercial buildings, and achieve heat insulation effect and light transmission The effect of good yield, increased deposition rate and better overall performance

Inactive Publication Date: 2014-01-01
HANGZHOU ZEAL SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in addition to blocking the infrared part of sunlight, the heat insulation film will also block the visible light of sunlight, resulting in a reduction in the brightness of the interior space of commercial buildings

Method used

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  • Electrostatic-adhered heat-insulating film and manufacturing method thereof
  • Electrostatic-adhered heat-insulating film and manufacturing method thereof
  • Electrostatic-adhered heat-insulating film and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] (1) Provide the substrate, which is a carbon fiber film;

[0051] (2) A titanium layer is deposited on the surface of the carbon fiber film by using a physical vapor deposition process (PVD), and a direction control electric field is applied to the deposition surface during the deposition process, so that the deposition direction of the titanium layer grains is consistent;

[0052] (3) drying the semi-finished product obtained in step (2);

[0053] (4) adopting the bias magnetron sputtering method to deposit a layer of coating layer again;

[0054] (5) drying the semi-finished product obtained in step (4);

[0055] (6) The lower surface of the carbon fiber membrane is coated with a silica gel layer;

[0056] (7) Cover and remove the film on the silica gel layer on the lower surface of the carbon fiber film;

[0057] (8) Finally, it is dried and integrally formed to obtain the electrostatically adhesive heat-insulating film.

[0058] The total thickness of the compos...

Embodiment 2

[0061] To manufacture an electrostatically adhered thermal insulation film, the steps are as follows:

[0062] (1) Provide the substrate, which is a carbon fiber film;

[0063] (2) A titanium layer is deposited on the surface of the carbon fiber film by physical vapor deposition (PVD). The deposition temperature is 80°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface to make the titanium layer grains arranged in vertical stripes;

[0064] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;

[0065] (4) drying the semi-finished product obtained in step (3), the drying temperature is 80°C, and the drying time is 2-3h;

[0066] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;

[0067] (6) drying the semi-finished product obtained in step (5), the dryi...

Embodiment 3

[0076] To manufacture an electrostatically adhered thermal insulation film, the steps are as follows:

[0077] (1) Provide the substrate, which is a carbon fiber film;

[0078] (2) Use physical vapor deposition (PVD) to deposit a titanium layer on the surface of the carbon fiber film. The deposition temperature is 100°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface to make the titanium layer grains arranged in vertical stripes;

[0079] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;

[0080] (4) drying the semi-finished product obtained in step (3), the drying temperature is 100° C., and the drying time is 3 hours;

[0081] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;

[0082] (6) drying the semi-finished product obtained in step (5), th...

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Abstract

The invention provides a manufacturing method of an electrostatic-adhered heat-insulating film having the characteristics of excellent light transmission property, high infrared and ultraviolet reflection rates, simple manufacturing process and durability. The manufacturing method of the electrostatic-adhered heat-insulating film comprises the step of overlapping functional layers on a provided substrate layer.

Description

technical field [0001] The invention relates to an electrostatically adhesive heat-insulating film and a manufacturing method thereof. Background technique [0002] The main function of the insulation film is to hinder the transfer of heat. Insulation film is not only widely used in various vehicles, but also in buildings. According to statistics, in general commercial buildings, electricity consumption related to air conditioning accounts for about 47% of the total electricity consumption. Therefore, reducing the electricity demand for air-conditioning is a very important issue for saving building operating costs. [0003] The infrared part of sunlight is the most important heat source in nature. After sunlight (especially the infrared part) enters the interior of the commercial building, the indoor temperature will increase. In order to reduce the solar radiation entering the building, thermal insulation films are generally attached to the windows of the commercial buil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/04B32B27/06B32B27/12B32B27/18B32B27/36
Inventor 葛敏军
Owner HANGZHOU ZEAL SCI & TECH
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