Electrostatic-adhered heat-insulating film and manufacturing method thereof
A technology of electrostatic adhesion and manufacturing method, applied in the direction of chemical instruments and methods, synthetic resin layered products, layered products, etc., can solve the problems of brightness reduction and blocking in the interior space of commercial buildings, and achieve heat insulation effect and light transmission The effect of good yield, increased deposition rate and better overall performance
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Embodiment 1
[0050] (1) Provide the substrate, which is a carbon fiber film;
[0051] (2) A titanium layer is deposited on the surface of the carbon fiber film by using a physical vapor deposition process (PVD), and a direction control electric field is applied to the deposition surface during the deposition process, so that the deposition direction of the titanium layer grains is consistent;
[0052] (3) drying the semi-finished product obtained in step (2);
[0053] (4) adopting the bias magnetron sputtering method to deposit a layer of coating layer again;
[0054] (5) drying the semi-finished product obtained in step (4);
[0055] (6) The lower surface of the carbon fiber membrane is coated with a silica gel layer;
[0056] (7) Cover and remove the film on the silica gel layer on the lower surface of the carbon fiber film;
[0057] (8) Finally, it is dried and integrally formed to obtain the electrostatically adhesive heat-insulating film.
[0058] The total thickness of the compos...
Embodiment 2
[0061] To manufacture an electrostatically adhered thermal insulation film, the steps are as follows:
[0062] (1) Provide the substrate, which is a carbon fiber film;
[0063] (2) A titanium layer is deposited on the surface of the carbon fiber film by physical vapor deposition (PVD). The deposition temperature is 80°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface to make the titanium layer grains arranged in vertical stripes;
[0064] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;
[0065] (4) drying the semi-finished product obtained in step (3), the drying temperature is 80°C, and the drying time is 2-3h;
[0066] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;
[0067] (6) drying the semi-finished product obtained in step (5), the dryi...
Embodiment 3
[0076] To manufacture an electrostatically adhered thermal insulation film, the steps are as follows:
[0077] (1) Provide the substrate, which is a carbon fiber film;
[0078] (2) Use physical vapor deposition (PVD) to deposit a titanium layer on the surface of the carbon fiber film. The deposition temperature is 100°C and the deposition time is 1h. During the deposition process, a vertical direction control electric field is applied to the deposition surface to make the titanium layer grains arranged in vertical stripes;
[0079] (3) Depositing a titanium nitride layer on the surface of the titanium layer by a physical vapor deposition process;
[0080] (4) drying the semi-finished product obtained in step (3), the drying temperature is 100° C., and the drying time is 3 hours;
[0081] (5) Depositing a nickel oxide coating layer on the titanium nitride layer by using a bias magnetron sputtering method;
[0082] (6) drying the semi-finished product obtained in step (5), th...
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