Preparation method of copper nanowire arrays with porous structure and film conductivity measuring method thereof

A technology of copper nanowires and arrays, applied in the field of preparing copper nanowire arrays, can solve the problems of poor repeatability of the reaction, restrictions on large-scale production of copper nanowires, slow reaction time, etc.
CN103510048AInactive Publication Date: 2014-01-15杭州知创新材料技术有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
杭州知创新材料技术有限公司
Publication Date
2014-01-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a normal temperature preparation method of copper nanowire arrays. The method comprises the following steps: putting a copper target material in a direct current platform 1 in a vacuum chamber of a magnetron sputtering instrument, placing a substrate plate on a sample platform 2, modulating the distance between the sample platform 2 and the direct current platform 1 in a range of 50 to 90 mm; vacummizing the vacuum chamber until the vacuum degree of the vacuum chamber reaches 2.0*10<-4> to 4.0*10<-4> Pa; pumping argon gas into the vacuum chamber at the room temperature, adjusting the pressure of argon gas in a range of 1.0 to 2.0 Pa; applying a direct current voltage between a negative pole, which is tightly connected to the target material and a positive pole, which is tightly connected to the back of the substrate plate (namely a DC voltage), controlling the current to be in a range of 80 to 120 mA and the voltage to be in a range of 0.25 to 0.35 kV; carrying out deposition for 1 to 7 hours, turning off the direct current power supply, in-situ annealing for 20 minutes, and naturally cooling to the room temperature of 25 DEG C so as to prepare aluminium nitride, quartz or copper substrate coated with a copper nanowire array film. The copper nanowire arrays obtained by the preparation method have a uniform structure, effectively guarantee the even distribution of nano phase, and have the advantages of simple whole deposition technical process, low cost, and easiness in industrial production.
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Description

technical field

[0001] The invention relates to a method for preparing a copper nanowire array on an aluminum nitride substrate by using a magnetron sputtering method at room temperature. A method for testing the electrical conductivity of a copper nanowire array film by using a four-probe method. Background technique

[0002] Nanomaterials can be widely used in chemical industry, electronics, textile, light industry, military, medical and other fields, among which the most promising is the electronics industry. One-dimensional structured nanomaterials (such as nanowires, nanorods, and nanotubes, etc.) are currently a hot topic in nanomaterials research. One-dimensional metal nanomaterials are a good combination of the characteristics of one-dimensional nanomaterials and metals themselves, and also have excellent physical and chemical properties. At present, one-dimensional metal nanomaterials have attracted much attention because of their potential applications in ultra-h...

Claims

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