Moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with vacuum cover

A technology of motion platform and degree of freedom, applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of cable interference movement, performance limitation, etc., to improve control bandwidth, prevent drift, and improve anti-interference ability Effect

Active Publication Date: 2014-01-29
TSINGHUA UNIV +1
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

The silicon wafer stage technology using the maglev planar motor can meet the requirements of lithography equipment, but when there is extreme ultraviolet lithography, some potting glue of the maglev planar motor will release some gas, which will have a certain impact on the lithography, and the planar There will be a large number of power sources and sensor cables on the motor to interfere with the movement, and its performance is limited to a certain extent

Method used

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  • Moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with vacuum cover
  • Moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with vacuum cover
  • Moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with vacuum cover

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Embodiment Construction

[0023] figure 1 Schematic diagram of the structure of a moving iron cable-free six-degree-of-freedom maglev motion platform with a vacuum cover provided by the present invention, figure 2 A three-dimensional exploded structure diagram for removing the vacuum cavity of the mover and the vacuum cavity of the stator; the maglev motion platform includes a base 1, a stator, a mover, a slide table 2 and a measurement system, and the mover contains a Halbach permanent magnet array 13 and The magnetic steel backboard 4; the stator is a coil array 14 formed by a plurality of groups of coil units 9; the measurement system includes a plane grating ruler measurement system 12, an eddy current sensor 11 and a laser triangulation sensor 15; A three-axis gyroscope 5, a three-axis accelerometer 6, a power module 7 and a wireless signal output module 19 are also provided between the moving element and the slide table 2; the three-axis gyroscope 5, the three-axis acceleration The meter 6, the...

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Abstract

The invention discloses a moving-iron cableless six-degree-of-freedom magnetic levitation motion platform with a vacuum cover and is mainly applied to semiconductor photoetching equipment. The magnetic levitation motion platform comprises a base, a stator, a rotor, a slide holder and a measurement system, wherein a three-axis gyroscope, a three-axis accelerator, a power supply module and a wireless signal output module are arranged between the rotor and the slide holder and are integrated on a circuit board; the rotor and the stator are respectively arranged in a vacuum cavity. The moving-iron cableless six-degree-of-freedom magnetic levitation motion platform realizes high-precision measurement by adopting a planar grating scale measurement system and also realizes a cableless design of the magnetic levitation motion platform by applying a wireless charging technology and a wireless signal transmission technology, and moving parts of the magnetic levitation motion platform can realize large-angle free rotation in a horizontal plane; therefore, the interference resistance of a workbench and the control bandwidth of a control system are greatly improved; meanwhile, the influence of gas released by certain pouring sealants on photoetching is avoided during extreme ultraviolet photoetching.

Description

technical field [0001] The invention relates to a maglev workbench, in particular to a six-degree-of-freedom maglev workbench, which is mainly used in semiconductor photolithography equipment and belongs to the technical field of ultra-precision processing and detection equipment. Background technique [0002] The micro-motion table with high precision and fast response has an extremely important position in modern manufacturing technology, and is regarded as an important symbol of a country's high-tech development level. In ultra-precision machine tools, the ultra-precision micro-motion table is used to compensate the error of the feed system to achieve ultra-precision machining; in the manufacture of large-scale integrated circuits, the ultra-precision micro-motion table is used for micro-positioning in lithography equipment and micro-feeding; in the scanning probe microscope, the ultra-precise micro-motion table is used to measure the surface topography of the sample for ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 张鸣朱煜徐登峰成荣刘召杨开明张利秦慧超赵彦坡胡清平田丽叶伟楠张金尹文生穆海华胡金春
Owner TSINGHUA UNIV
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