Solar cell panel, manufacturing method thereof and solar cell comprising solar cell panel
A solar cell panel and silicon nitride layer technology, applied in the field of solar cells, can solve the problems of solar cell light-induced attenuation and achieve the effects of suppressing light-induced attenuation, high photoelectric conversion efficiency, and reducing light-induced attenuation
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[0032] In addition, the present invention also provides a method for preparing a solar cell panel, which includes the step of disposing a silicon nitride film on the surface of the silicon wafer, wherein the step of disposing the silicon nitride film on the surface of the silicon wafer includes: disposing a second silicon nitride film on the silicon wafer A silicon nitride layer; a second silicon nitride layer with a higher refractive index than the first silicon nitride layer is set on the first silicon nitride layer.
[0033]In the solar panel formed by the above method, since the silicon nitride layer on the outer layer of the silicon wafer has a higher refractive index, the surface of the silicon wafer has a stronger blocking effect on ultraviolet rays, thereby effectively weakening the intensity of ultraviolet rays entering the silicon nitride film. This can prevent the incoming ultraviolet light from activating the K inside the silicon nitride film to a certain extent. 0...
Embodiment 1
[0042] A silicon nitride film is deposited on the surface of the silicon wafer by PECVD. The specific process flow is as follows: the deposition temperature is set to 300°C, the conveyance speed of the boat is 205cm / min, and the gas flow in the six groups of intake pipes is set to the following flow:
[0043]
[0044] Through the above process flow, a silicon wafer provided with a silicon nitride film is obtained, and a solar battery panel is prepared from the silicon wafer.
Embodiment 2
[0046] A silicon nitride film is deposited on the surface of the silicon wafer by PECVD. The specific process flow is as follows: the deposition temperature is set to 300°C, the conveyance speed of the boat is 205cm / min, and the gas flow in the six groups of intake pipes is set to the following flow:
[0047]
[0048] Through the above process flow, a silicon wafer provided with a silicon nitride film is obtained, and a solar battery panel is prepared from the silicon wafer.
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