Method for preparing metal pattern on curved surface by combining nano-imprinting with wet etching

Abstract

The invention discloses a method for preparing a metal pattern on a curved surface by combining nano-imprinting with wet etching. The method comprises the following steps: firstly, evaporating one layer of metal on the curved surface; then imprinting a pattern on the metal by a transferring method; etching to remove a residual layer by a reaction ion etching method; etching the metal to a base by taking imprinting glue as a mask; and then removing the imprinting glue on the upper layer of the metal pattern by using the reaction ion etching to obtain the metal pattern. The method disclosed by the invention is simple and feasible; an ion lifting process is replaced on a plane to prepare the metal pattern; compared with a common ion lifting process, the integrity of the pattern is not easy to damage and the defects are reduced; the metal pattern is prepared on the curved surface and the process of preparing the pattern on the curved surface cannot be realized by the ion lifting process. The method has a wide application prospect in the fields of production of a fiber Bragg grating, a refraction / diffraction mixed optical element, a nano electromechanical system and the like.

Description

technical field [0001] The invention relates to a method for preparing a metal pattern on a curved surface by using nanoimprint technology combined with wet etching. Background technique [0002] Recently, the preparation of nanostructures on curved and complex surfaces has attracted more and more attention, especially in the fields of artificial compound eyes, hemispherical electronic eye cameras, photovoltaic devices, image sensor arrays, micro actuators and fiber optic sensors. widely. In 1995, since Steven Y. Chou and others invented nanoimprint technology, nanoimprint technology has attracted many researchers and engineers in the field of microstructure production due to its advantages of high efficiency, high resolution and low cost. focus on. Although many micro-nanofabrication techniques can fabricate patterned nanostructures on planar substrate surfaces, most of these techniques are not suitable for fabricating nanopatterns on non-planar substrate surfaces. There...

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Problems solved by technology

The lift-off process needs to obtain a uniform lift-off layer, and it is impossible to use the spin-coating process to obtain a uniform film on the curved surface; while using a soft template for curved surface imprinting, only UV-curable imprinting glue can be used for embossing, and After the imprinting glue is cured under ultraviolet light, a cross-linked network is formed, so that it can no longer be dissolved in organic solvents, and cannot be lifted.

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