A high-silicon PVD hard coating process
A hard coating and process technology, which is applied in the field of high-silicon PVD hard coating technology, can solve the problems of restricting the application of high temperature and anti-wear fields, high temperature friction coefficient, etc., and achieve the goal of improving competitiveness, strong performance and high efficiency Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0032] A kind of high silicon PVD hard coating process is characterized in that: comprises the following steps:
[0033] (1) Load the workpiece: load the cleaned workpiece into the vacuum furnace;
[0034] (2) Vacuuming: Vacuum is formed in the vacuum furnace, and the pressure is reduced to p<0.0001mbar;
[0035] (3) Workpiece heating: Heating the workpiece through the heating tube in the furnace to 400-500°C for 1-2 hours;
[0036] (4) Cleaning of the target itself: argon gas is introduced into the vacuum furnace, the bias voltage is 300v, the argon gas fills the furnace cavity, the target material generates plasma, and the target material is cleaned through the ion etching process, and the cleaning time is 360s;
[0037] (5) Workpiece cleaning: Argon gas is introduced into the vacuum furnace, the bias voltage is 500v-600v, the cleaning time is 720s-1020s, and the flow rate of argon gas is 50-100 sccm. When the target is powered on, and the coating in the target The layer m...
PUM
![No PUM](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com