Carbon nano-tube cathode preparation method

Abstract

The invention relates to a carbon nano-tube cathode preparation method. The method includes the steps: polishing the surface of a stainless steel substrate, and forming a rough surface with a certain roughness on the surface of the stainless steel substrate; placing the stainless steel substrate into a magnetron sputtering chamber, evacuating the magnetron sputtering chamber to reach a preset vacuum degree, sputtering a titanium transition layer with a preset thickness on the rough surface by magnetron, placing the stainless steel substrate sputtered with the titanium transition layer into a chemical vapor deposition chamber, leading acetylene into the chemical vapor deposition chamber, and performing chemical vapor deposition of the acetylene on the substrate to form a carbon nano-tube; annealing the formed carbon nano-tube in a vacuum environment. When the formed carbon nano-tube is annealed, titanium, the carbon nano-tube and the substrate react, so that the carbon nano-tube and the substrate are organically combined, the combined strength of the carbon nano-tube and the substrate is enhanced, interface contact resistance is decreased, electron transfer capacity is enhanced, the carbon nano-tube in a carbon nano-tube cathode is prepared by the method, and performances of the carbon nano-tube cathode can be improved.

Description

technical field [0001] The invention relates to the manufacture of carbon nanomaterials, in particular to a method for preparing a carbon nanotube cathode. Background technique [0002] Since the discovery of carbon nanotubes by Japanese scientist Iijima in 1991, people have conducted in-depth and extensive research on the preparation, growth mechanism, structural characteristics, properties and applications of carbon nanotubes. Carbon nanotubes have a unique one-dimensional tubular structure, small radius of curvature, large aspect ratio and mechanical strength, good thermal and chemical stability, etc., making it an ideal field emission cathode material. The field of vacuum microelectronic devices has broad application prospects. [0003] At present, the commonly used preparation methods for carbon nanotube cathodes include screen printing, electrophoresis, and direct growth methods. Screen printing has the advantages of simple process, low cost, good repeatability, and ...

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Problems solved by technology

Screen printing has the advantages of simple process, low cost, good repeatability, and large-area printing. However, the residual organic matter will outgas under high temperature conditions, which will affect the field emission performance of the cathode to a certain extent; electrophoresis has the advantages of simple process and low cost. , short preparation cycle, etc., and can realize large-area preparation on a conductive substrate of any shape, but the bonding force between carbon nanotubes and the substrate is very poor, so that the emission current will fluctuate due to falling off during the field emission process; The direct growth method is to directly grow oriented or non-oriented carbon nanotube films on the substrate material. This method has the advantages of low impurity content and high bonding strength, but the growth temperature is generally high, and the preparation on the glass substrate has certain advantages. difficulty

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