Hydrophobic self-cleaning transparent sound-absorption film and preparation method thereof
A transparent and thin-film technology, which is applied in coatings, special surfaces, and devices for coating liquids on surfaces, can solve problems such as micropore blockage on the surface of sound-absorbing films, corrosion of sound-absorbing materials, and expensive chlorosilanes. Improve sound absorption and noise reduction performance, good light transmittance effect
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[0027] A method for preparing a hydrophobic self-cleaning transparent sound-absorbing film of the present invention comprises the following steps:
[0028] (1) Mechanically process the transparent polymer base film to form a microporous structure on the surface. The thickness of the base film ranges from 0.05 to 0.3 mm. The diameter of the micropores ranges from 0.05 to 0.3 mm;
[0029] (2) Preparation of nano-silica particles: Dissolve tetraethyl orthosilicate in ethanol solution, stir to keep the temperature at 20~90°C, add ammonia solution and KH-570, tetraethyl orthosilicate to the mixture dropwise The molar concentration ratio of ester, ammonia water and KH-570 is 1:1.2:1.53~1:21.2:1.53, and the reaction is continued. After the reaction, the mixed solution is dried and ground to obtain nano-silica particles;
[0030] (3) Preparation of polyvinylidene fluoride (PDVF) mixed solution: mix N-N-dimethylformamide and butanone, add polyvinylidene fluoride powder, N-N-dimethylf...
Embodiment 1
[0038] (1) Mechanically process the transparent polycarbonate base film to form a microporous structure on the surface. The thickness of the base film ranges from 0.05 to 0.3 mm. The diameter of the micropores ranges from 0.05 to 0.3 mm;
[0039] (2) Dissolve tetraethyl orthosilicate (3ml) in (60mL) ethanol solution, stir to keep the temperature at 20°C, add ammonia solution and KH-570, tetraethyl orthosilicate, ammonia water and The molar concentration ratio of KH-570 is 1:10:1.53, and the reaction is continued. After the reaction, the mixed solution is dried and ground to obtain nano-silica particles;
[0040] (3) Preparation of polyvinylidene fluoride (PDVF) mixed solution: Mix 25mL N,N-dimethylformamide and 3mL butanone, add 1.7g polyvinylidene fluoride powder to the mixture, stir and dissolve to obtain PDVF mixture;
[0041](4) Add the nano-silica particles prepared in step (2) to the PDVF mixed solution in step (3), and the amount of nano-silica particles added is 0.0...
Embodiment 2
[0045] (1) Mechanically process the transparent polyacrylate base film to form a microporous structure on the surface. The thickness of the base film ranges from 0.05 to 0.3 mm. The diameter of the micropores ranges from 0.05 to 0.3 mm;
[0046] (2) Dissolve tetraethyl orthosilicate (1ml) in (60mL) ethanol solution, stir to keep the temperature at 90°C, add ammonia solution and KH-570, tetraethyl orthosilicate, ammonia water and The molar concentration ratio of KH-570 is 1:14:1.53, and the reaction is continued. After the reaction is completed, the mixed solution is dried and ground to obtain nano-silica particles;
[0047] (3) Preparation of polyvinylidene fluoride (PDVF) mixed solution: Mix 30mL N,N-dimethylformamide and 5mL butanone, add 1.1g polyvinylidene fluoride powder to the mixture, stir and dissolve to obtain PDVF mixture;
[0048] (4) Add the nano-silica particles prepared in step (2) to the PDVF mixed solution in step (3). The amount of nano-silica particles add...
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