Anti-irradiation Technology and Implementation Method Based on Back Gate Transistor
An anti-radiation, transistor technology, applied in the direction of electric solid-state devices, semiconductor devices, semiconductor/solid-state device components, etc., can solve the problems of integration limitations, application limitations, and high costs, and achieve improved performance, low cost, and high speed. Effect
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[0037] The specific embodiment of the present invention will be further described below in conjunction with accompanying drawing:
[0038] The anti-irradiation technology proposed in the present invention is based on a transistor structure with a back gate bias, which can be a bulk silicon transistor or a silicon-on-insulator (SOI) transistor; it can be a general MOS transistor or a Emerging Finfet transistors. A bulk silicon Finfet structure with back gate bias such as figure 2As shown, 1 is the substrate, which is also the back gate bias layer of the transistor, 2 is the doped source region or drain region, 3 is the gate oxide layer, 4 is the gate of the transistor, and 5 is the Fin of the transistor. The channel, 6 is an insulating structure, and 7 is an insulating oxide layer, which also constitutes the oxide layer of the back gate. An insulating structure 6 is embedded on the back gate bias layer 1, and an insulating oxide layer 7 is covered on the surface of the back ...
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