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Method of extracting high-purity fluosilicic acid and silicon dioxide by utilizing industrial fluorine-containing tail gas acid

A pure silicon dioxide, silicon dioxide technology, applied in the direction of silicon dioxide, silicon oxide, silicon halide compounds, etc., can solve the problem of difficulty in removing dust particles, and achieve a novel production process, high purity, high commercial value. Effect

Inactive Publication Date: 2014-07-16
应烈荣
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main component of industrial fluorine-containing tail gas acid is fluosilicic acid, followed by impurities such as dust particles, sulfuric acid, and fluosulfonic acid. Among them, fluosilicic acid is valuable for recovery. However, dust particles, sulfuric acid, and Impurities such as fluorosulfonic acid are relatively difficult, and now the industry has no good method to effectively extract high-purity fluorosilicic acid

Method used

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  • Method of extracting high-purity fluosilicic acid and silicon dioxide by utilizing industrial fluorine-containing tail gas acid

Examples

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Effect test

no. 1 example

[0027] Preliminary impurity removal step: add Huangdan powder to the industrial fluorine-containing tail gas acid to remove sulfate ions in the fluorosilicic acid, and then filter the industrial fluorine-containing tail gas acid to remove solid impurities.

[0028] The next steps are:

[0029] Step 1, mixing sodium hydroxide with industrial fluorine-containing tail gas acid, and generating sodium fluorosilicate precipitate after fully reacting;

[0030] The reaction formula is: H 2 SiF 6 +2NaOH→Na 2 SiF 6 ↓+2H 2 O;

[0031] Step 2: Centrifuging and dehydrating the sodium fluorosilicate precipitate, and washing the impurities attached to the sodium fluorosilicate precipitate with a small amount of water; the residual liquid filtered off is subjected to wastewater treatment and discharged after reaching the standard.

[0032] Step 3, putting the sodium fluorosilicate precipitate into a desiccator and drying to below 1% water content (by weight) to obtain dry sodium fluoro...

no. 2 example

[0045] Preliminary impurity removal step: add Huangdan powder to the industrial fluorine-containing tail gas acid to remove sulfate ions in the fluorosilicic acid, and then filter the industrial fluorine-containing tail gas acid to remove solid impurities.

[0046] The next steps are:

[0047] Step 1, mixing sodium chloride with industrial fluorine-containing tail gas acid, and generating sodium fluorosilicate precipitate after fully reacting;

[0048] The reaction formula is: H 2 SiF 6 +2NaCL→Na 2 SiF 6 +2HCL;

[0049] Step 2: Centrifuging and dehydrating the sodium fluorosilicate precipitate, and washing off the HCL impurities attached to the sodium fluorosilicate precipitate with a small amount of water; the filtered residual liquid is treated with waste water and discharged after reaching the standard.

[0050] Step 3, putting the sodium fluorosilicate precipitate into a desiccator and drying to below 1% water content (by weight) to obtain dry sodium fluorosilicate; ...

no. 3 example

[0061] Preliminary impurity removal step: add Huang Dan powder to the industrial fluorine-containing tail gas acid to remove sulfate ions in the fluorosilicate acid, and then filter the industrial fluorine-containing tail gas acid to remove solid impurities.

[0062] The next steps, in order, are:

[0063] Step 1, mixing potassium chloride with industrial fluorine-containing tail gas acid, fully reacting to generate potassium fluorosilicate precipitate;

[0064] The reaction formula is: H 2 SiF 6 +2KCL→K 2 SiF 6 +2HCL;

[0065] Step 2: Centrifuge and dehydrate the potassium fluorosilicate precipitate, and wash away the HCL impurities attached to the potassium fluorosilicate precipitate with a small amount of water; the filtered residual liquid is treated with waste water and discharged after reaching the standard.

[0066] Step 3, putting the potassium fluorosilicate precipitate into a desiccator and drying until the water content (in parts by weight) is below 1%, to obta...

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Abstract

The invention discloses a method of extracting high-purity fluosilicic acid and silicon dioxide by utilizing industrial fluorine-containing tail gas acid, relates to the chemical field, and the method is capable of utilizing the tail gas acid to produce high-purity fluosilicic acid and silicon dioxide at the same time, and is a creative breakthrough on process. The method comprises the steps: generating solid villiaumite by the tail gas acid, wherein high-purity villiaumite can be obtained by the step of generating the solid villiaumite; then, heating and decomposing the solid villiaumite to generate a more pure silicon tetrafluoride gas, wherein content of impurities such as HCL, SO4, and the like in the obtained silicon tetrafluoride gas is less; purifying the silicon tetrafluoride gas, so that the silicon tetrafluoride gas achieves higher purity; finally, absorbing the silicon tetrafluoride gas by using super-pure water to generate super-pure fluosilicic acid and super-pure silicon dioxide. The method has the advantages of being novel in production process, and high in purity of the extracted fluosilicic acid and silicon dioxide.

Description

technical field [0001] The invention relates to the field of chemical industry, in particular to high-purity fluorosilicic acid, in particular to a method for extracting high-purity fluorosilicic acid and silicon dioxide by utilizing industrial fluorine-containing tail gas acid. Background technique [0002] In the production process of phosphate fertilizer and hydrofluoric acid, a large amount of fluorine-containing tail gas is produced, which seriously pollutes the environment and becomes a bottleneck hindering the development of the two industries. At the same time, it also wastes a lot of valuable fluorine resources. In recent years, although many experts have done many useful explorations and achieved gratifying results, there is still a large backlog of fluorosilicic acid absorbed by the exhaust gas waiting to be treated, which brings great pressure to environmental protection work. The main component of industrial fluorine-containing tail gas acid is fluorosilicic aci...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/10C01B33/12
Inventor 应烈荣
Owner 应烈荣
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