The present invention is a technique for manufacturing a crystalline silicon solar cell piece, especially a technique for manufacturing a high-efficiency, low cost and thin-sheet solar cell piece, and the invention belongs to the solar energy application field. The technique aims at the thin-sheet crystal silicon chip with thickness less than 200 mu m, by adopting innovated technique and developing the original technique, combines the domestic cell whole equipment which is independently developed, settles the contradiction between the thin sheet and the fraction ratio, finished product rate and the electrical property, and satisfies the request of the cell piece product line to the high efficiency and low cost. The technique for manufacturing crystal silicon solar cell piece is subdivided to seven steps according to the process flow: eliminating the injury and coarsen the surface, diffusing to make a knot, plasma etching for eliminating the edge, PSG eliminating, PECVD depositing Si3N4 film, printing positive back electrode slurry and back field slurry on the silk screen, and co-baking to form an ohm contact. When the technique is adopted for the size 125*125mm<2>, the efficiency of the single crystalline silicon solar cell piece is up to 16.5, and the efficiency of the polycrystalline silicon solar cell is up to 15.0%.