Preparation method of lubricating film
A technology of lubricating thin film and thin film layer is applied in the field of preparation of lubricating thin film, which can solve the problems of high cost, high production cost, and the resolution cannot be well solved, and achieves the effect of satisfying pattern transfer, high resolution and low cost.
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[0044] Example 1: A method for preparing a lubricating film, using ultraviolet hardening imprint lithography (UV-NIL), depositing a silicon-doped diamond-like film on a silicon substrate to prepare nano-patterns.
[0045] See attached figure 1 , Firstly process the surface of the film layer 1 and blow off the dust and foreign objects on the surface with high-purity nitrogen for about 1 minute; then spin-coat the SU-8 photoresist on the surface of the film layer with a thickness of about 500 nm, and spin The sample coated with SU-8 photoresist was exposed to a 1000W ultraviolet lamp for 1 minute, and then the exposed sample was cured by heating at 110°C for 5 minutes to form the intermediate layer 2. Then, the cured sample was spin-coated with UV ultraviolet curing glue, With a thickness of 200nm, a UV-curable nanoimprint adhesive layer 3 is formed; then the entire sample is covered with a structured soft imprint film 4, and the completely covered sample is exposed to a 1000W UV la...
Example Embodiment
[0048] Embodiment 2: A method for preparing a lubricating film, using ultraviolet hardening imprint lithography (UV-NIL), depositing a silicon-doped diamond-like carbon film on the surface of a sapphire substrate with a curvature to prepare a nano pattern.
[0049] Firstly, the surface of the curved substrate is treated, and the dust and foreign objects on the surface are blown with high-purity nitrogen. The time is about 1 minute; then, the SU-8 photoresist is spin-coated on the surface of the film layer with a thickness of about 400nm. The sample of SU-8 photoresist was exposed to 1000W ultraviolet lamp for 1 minute, and then the exposed sample was cured by heating at 110°C for 5 minutes to form an intermediate layer; then, the cured sample was spin-coated with UV ultraviolet curing adhesive with a thickness of 150nm, form a UV-curable nano-imprint adhesive layer; then cover the entire sample with a structured soft-embossed film, expose the completely covered sample to a 1000W U...
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