Supercharge Your Innovation With Domain-Expert AI Agents!

Method of using thin plates of same kind of material to prepare rectangular grating structure

A technology of rectangular gratings and material thin plates, applied in diffraction gratings, cold cathode manufacturing, electrode system manufacturing, etc., can solve the problems of large side roughness, expensive equipment, small grating groove aspect ratio, etc., and achieve smooth and steep sides, The effect of large aspect ratio

Active Publication Date: 2014-09-10
HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to solve these problems, researchers tried to use the UV-LIGA process to prepare high-precision gratings, but practice has proved that this process still faces the problems of small aspect ratio of grating grooves, large side roughness, and low material density when preparing gratings. , and complex processing, expensive equipment and other difficulties

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method of using thin plates of same kind of material to prepare rectangular grating structure
  • Method of using thin plates of same kind of material to prepare rectangular grating structure
  • Method of using thin plates of same kind of material to prepare rectangular grating structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] First prepare the thickness h 1 、h 2 Two types of veneer, the surface of the veneer is sanded to make it smooth. Then, the two kinds of thin plates are cross-stacked, and one of the end faces of the stacked structure meets the following requirements: 1) The distance between adjacent thin plates at this end is equal; 2) The thickness of the alternate thin plates is the same, and the side faces at this end are on the same 3) The side of each thin plate at the end face is perpendicular to the upper and lower surfaces of the thin plate. Finally, the structure is made into a single piece by resistance welding or other processes. In this way, a grating structure is formed on the end face, where the period l of the grating is determined by the thickness of the two thin plates (ie l = h 1 + h 2 ), the depth of the grating groove is determined by the distance between the adjacent thin plates at the end, and the width of the grating groove is determined by the thickness of th...

Embodiment 2

[0035] To fabricate an oxygen-free copper grating that can be used as a slow-wave system for diffractive radiation vacuum electronic devices, the period length l of the grating is required to be 0.1 mm, the groove width is 0.05 mm, and the depth is 5 mm.

[0036] Step 1. Material preparation

[0037] Prepared by mechanical processing or purchased commercially, obtain oxygen-free copper sheets with a thickness of 0.05 mm, and then process these sheets into two cuboids with a width of 20 mm×10 mm×0.05 mm and a thickness of 15 mm×10 mm×0.05 mm by cutting A and B, the surface roughness of these cuboids is required to be less than 50nm.

[0038] Step 2. Stacking of plates

[0039] When stacking, two boards with different lengths should be stacked alternately, and the short sides and long sides are parallel to each other, and the following principles should be followed:

[0040] 1) The length of the interphase plates is the same, and the long and wide sides of the interphase p...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Slot widthaaaaaaaaaa
Depthaaaaaaaaaa
Surface roughnessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a method of using thin plates of the same kind of material to prepare a rectangular grating structure. Through cross superposition of two kinds of thin plates which are different in thicknesses according to a specific rule, a grating with specific periodic structures is manufactured. The period of the grating is decided by the thicknesses of the two kinds of thin plates. The widths of grating grooves are decided by the thicknesses of one kind of thin plates and the depths of the grating grooves are decided by face distances of the side faces of the two kinds of thin plates. The method is capable of preparing a high-precision grating which is high in depth-to-width ratio and smooth and steep in side faces. The grating structure is widely applicable to manufacturing of a slow-wave structure and a fine manufacturing mould of a vacuum electronic device.

Description

technical field [0001] The invention relates to a method for preparing a rectangular grating, in particular to a method for preparing a rectangular grating structure by using a thin plate of the same material. Background technique [0002] Rectangular gratings are widely used in vacuum electronics devices, such as slow-wave structures of diffractive radiation oscillator devices. When the working frequency of vacuum electronic devices is relatively low, the required period of the grating and the width of the grating groove are relatively large. At this time, the grating structure can be prepared by mechanical processing methods, such as milling machine, planer, EDM and other processes. With the increase of the operating frequency of the device, the device has higher and higher requirements for the grating, such as the grating period and the width of the groove are getting smaller and smaller; in order to alleviate the high-frequency skin effect, the surface roughness of the g...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01J9/00G02B5/18
Inventor 吴华夏席洪柱温旭杰张建成余锋
Owner HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com