Unlock instant, AI-driven research and patent intelligence for your innovation.

Coated glass with ZrSiNx film and preparation method of coated glass

A technology of coated glass and thin film, applied in chemical instruments and methods, glass/slag layered products, sputter coating, etc., can solve the problem of poor acid and alkali corrosion resistance and scratch resistance, poor mechanical properties, and alkali corrosion resistance Poor, poor mechanical properties of scratch resistance, etc., to achieve the effect of improving machinability, fast deposition rate, improving scratch resistance and oxidation resistance

Inactive Publication Date: 2014-10-29
林嘉佑
View PDF4 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Although existing film systems can provide excellent solar control properties, commercial film systems still have the following deficiencies: (a) poor alkaline corrosion resistance, especially for high temperature conditions; (b) scratch-resistant mechanical properties Difference
More generally, TiO2 or SnO2 commonly used in this field as a dielectric layer has worse mechanical properties than Si3N4
It can be seen that the traditional coated glass has defects such as poor acid and alkali corrosion resistance and scratch resistance mechanical properties.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Coated glass with ZrSiNx film and preparation method of coated glass
  • Coated glass with ZrSiNx film and preparation method of coated glass
  • Coated glass with ZrSiNx film and preparation method of coated glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Such as figure 2 As shown, in the first embodiment of the present invention, the ZrSiNx film is directly coated on the glass substrate, that is, the ZrSiNx film is the bottom dielectric layer, which protects the glass substrate and reduces the reflectivity of the glass. In a vacuum environment with a process pressure of 2.5E-3mbar and a sputtering power of 38KW, 500sccm of N2 gas and 400sccm of Ar gas are introduced, and silicon zirconium with a mass percentage of Si of 55% and a mass percentage of Zr of 45% The alloy target was subjected to magnetron sputtering to obtain a ZrSiNx thin film with a film thickness of 32nm. Then continue with the preparation of the back mask layer. The ZrSiNx thin film acting as the bottom dielectric layer on the glass substrate can be applied in solar control glass and low-emissivity coated glass.

Embodiment 2

[0028] Such as image 3 As shown, in the second embodiment of the present invention, the ZrSiNx film is the interlayer dielectric layer, which bonds the upper and lower film layers of the glass. In the preparation process of coated glass, when preparing ZrSiNx thin film, in a vacuum environment with a process pressure of 3.0E-3mbar and a sputtering power of 68KW, 600sccm of N2 gas and 500sccm of Ar gas are introduced. The mass percentage of Si Magnetron sputtering was performed on a silicon-zirconium alloy target with a mass percent of Zr of 83% and 17% to obtain a ZrSiNx thin film with a film thickness of 68nm. Then continue with the preparation of the back mask layer. The ZrSiNx thin film acting as an interlayer dielectric layer can be applied in solar control glass and low-emissivity coated glass.

Embodiment 3

[0030] Such as Figure 4 As shown, in the third embodiment of the present invention, the ZrSiNx film is coated on the outermost layer of the coating layer, that is, the ZrSiNx film is the top dielectric layer, in order to improve the scratch resistance, wear resistance and chemical corrosion resistance of the glass , to ensure its mechanical properties. In the preparation process of coated glass, after the other film layers are coated, in a vacuum environment with a process pressure of 2.8E-3mbar and a sputtering power of 50KW, 550sccm of N2 gas and 450sccm of Ar gas are introduced, and Si The mass percentage of Zr is 90%, and the mass percentage of Zr is 10% of the silicon-zirconium alloy target to perform magnetron sputtering to obtain a ZrSiNx thin film with a film thickness of 40nm. The ZrSiNx thin film acting as the top dielectric layer can be applied in solar control glass and low-emissivity coated glass.

[0031] Those skilled in the art can easily understand that the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a piece of coated glass with a ZrSiNx film. The coated glass is characterized by comprising a ZrSiNx film layer, wherein x is greater than or equal to 0 and is smaller than or equal to 4; the ZrSiNx film is prepared by performing magnetron sputtering deposition on silicon zirconium alloy in the presence of nitrogen N2 and argon Ar. The ZrSiNx film can be uniformly deposited and formed on a glass substrate, and the ZrSiNx film is in an amorphous state, is high in deposition rate, can be used as any electric medium layer of the coated glass, can improve the machinable property and the antioxidation property of the coated glass, and can improve the mechanical property.

Description

[0001] technical field [0002] The invention relates to the technical field of coated glass manufacturing, in particular to a coated glass with a ZrSiNx thin film and a preparation method thereof. Background technique [0003] At present, the existing commercial film systems such as: glass substrate / Si3N4 / NiCr / Ag / NiCr / Si3N4, or glass substrate / Si3N4 / NiCr / Si3N4, both Ag and NiCr are used as the sunlight far-infrared reflective layer of the functional film system . For example, in the technical solution disclosed in US Pat. No. 5,837,108, the NiCr can also be replaced by nitriding NiCrNx. [0004] Although existing film systems can provide excellent solar control properties, commercial film systems still have the following deficiencies: (a) poor alkaline corrosion resistance, especially for high temperature conditions; (b) scratch-resistant mechanical properties Difference. According to the location of the building, different humidity environments, acid-base conditions,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B32B17/06B32B9/04B32B33/00C23C14/35C23C14/06
Inventor 林嘉佑
Owner 林嘉佑