High-stability surface-enhanced Raman substrate and preparation method thereof

A surface-enhanced Raman, high-stability technology, used in Raman scattering, material excitation analysis, etc., can solve problems such as limitations, poor chemical stability, etc., to prevent oxidation, good surface-enhanced Raman effect, and broad application prospects Effect

Inactive Publication Date: 2014-12-03
TSINGHUA UNIV
View PDF3 Cites 16 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method needs to be based on high-sensitivity surface-enhanced Raman substrates such as gold and silver. Because silver nanostructure substrates are prone to oxidation and vulcanization under atmospheric conditions, their poor chemical stability limits the application of surface-enhanced Raman effects.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-stability surface-enhanced Raman substrate and preparation method thereof
  • High-stability surface-enhanced Raman substrate and preparation method thereof
  • High-stability surface-enhanced Raman substrate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] 1. Clean the silicon substrate or glass substrate sequentially with acetone, alcohol and deionized water and dry them;

[0019] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;

[0020] 3. At a temperature of 298K, using metallic silver as the target material, pump the chamber of the electron beam evaporation coating machine to 3×10 -5 Pa high vacuum;

[0021] 4. Adjust the incident angle of the electron beam to 80 degrees, and make the sample stage static, and grow a 250nm thick silver deposition film obliquely on the base of the sample stage;

[0022] 5. By low-temperature atomic layer deposition method, a uniform and dense aluminum oxide film of 0.7nm is deposited on a silver substrate at 50°C to prepare a silver-alumina composite film;

[0023] 6. Configure 10 -6 mol / L rhodamine 6G solution;

[0024] 7. Put the surface-enhanced Raman substrate prepared in steps 1 to 5 into the solution to be tested prepared in...

Embodiment 2

[0029] 1. Clean the silicon wafer substrate or glass substrate sequentially with acetone, alcohol, and deionized water and dry them;

[0030] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;

[0031] 3. At a temperature of 298K, using metallic silver as the target material, pump the chamber of the electron beam evaporation coating machine to 3×10 -5 Pa high vacuum;

[0032] 4. Adjust the incident angle of the electron beam to 83 degrees, and rotate the sample stage at a rate of 10rpm, and grow a 300nm thick silver deposition film obliquely on the substrate of the sample stage;

[0033] 5. By low-temperature atomic layer deposition method, a uniform and dense aluminum oxide film of 1.9nm is deposited on a silver substrate at 60°C to prepare a silver-alumina composite film;

[0034] 6. Configure 10 -6 mol / L rhodamine 6G solution;

[0035] 7. Put the surface-enhanced Raman substrate prepared in steps 1 to 5 into the solutio...

Embodiment 3

[0041] 1. Clean the silicon wafer substrate or glass substrate sequentially with acetone, alcohol, and deionized water and dry them;

[0042] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;

[0043] 3. At a temperature of 298K, using metallic silver as the target material, pump the chamber of the electron beam evaporation coating machine to 3×10 -5 Pa high vacuum;

[0044] 4. Adjust the incident angle of the electron beam to 86 degrees, and make the sample stage static, and grow a 400nm thick silver deposition film obliquely on the base of the sample stage;

[0045] 5. By low-temperature atomic layer deposition method, a uniform and dense aluminum oxide film of 2.6nm is deposited on a silver substrate at 70°C to prepare a silver-alumina composite film;

[0046] 6. Configure 10 -6 mol / L rhodamine 6G solution;

[0047] 7. Put the surface-enhanced Raman substrate prepared in steps 1 to 5 into the solution to be tested prep...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
thicknessaaaaaaaaaa
wavelengthaaaaaaaaaa
Login to view more

Abstract

The invention discloses a high-stability surface-enhanced Raman substrate and a preparation method thereof and belongs to the technical field of detection on trace organic substances. The preparation method of the high-stability surface-enhanced Raman substrate comprises the following steps: preparing a silver nanorod array by an oblique growth method and then uniformly coating the surface of silver nanorods with an amorphous-state aluminum oxide film by a low-temperature atom layer deposition technology. Due to the adoption of relatively low deposition temperature in the substrate prepared by the method, the shape of the silver nanorods is unchanged; meanwhile, by virtue of the ultrathin aluminum oxide film, a surface-enhanced Raman effect is not greatly attenuated, so that the substrate has a good surface-enhanced Raman effect; the surface of the silver nanorods is uniformly coated with the aluminum oxide film, so that the silver nanorods are isolated from an outside environment, the oxidation resistance and the vulcanization resistance of the silver s are improved, and the stability of the surface-enhanced Raman effect of the silver nanorods is greatly improved; the high-stability surface-enhanced Raman substrate has wide application prospects in the aspects of trace and fast detection on organic substances.

Description

technical field [0001] The invention belongs to the technical field of trace organic matter detection, and in particular relates to a highly stable silver-alumina nanorod surface-enhanced Raman effect substrate and a preparation method thereof. Background technique [0002] The surface-enhanced Raman effect is used in the trace detection of chemical and biological molecules, and has the advantages of high sensitivity, short detection time, low cost, and non-destructive analysis. This method needs to be based on high-sensitivity surface-enhanced Raman substrates such as gold and silver. Since silver nanostructure substrates are prone to oxidation and vulcanization under atmospheric conditions, their poor chemical stability limits the application of surface-enhanced Raman effects. [0003] Coating a layer of stability material on the silver nanostructure-enhanced Raman effect substrate can effectively improve the stability of the substrate. Since the melting point of the nano...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65
Inventor 张政军马菱薇
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap