Stainless steel material polishing agent for mechanical equipment and preparation method of stainless steel material polishing agent
A mechanical equipment and stainless steel technology, applied in the field of mechanical equipment stainless steel material polishing agent and its preparation, can solve the problems of poor composition stability, poor abrasive dispersibility, poor polishing ability of stainless steel polishing agent, etc., to achieve good stability and high effect Remarkable, good abrasive dispersion effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0020] A polishing agent for stainless steel materials of mechanical equipment, comprising the following components by weight: 10 parts of inorganic acid, 10 parts of dibasic carboxylic acid compound, 5 parts of calcium dihydrogen phosphate, 10 parts of water-soluble surfactant, 5 parts of glycerin, 10 parts of silicon oxide particles, 10 parts of stabilizer, 5 parts of catalyst, 5 parts of oxidant, 10 parts of buffer, 25 parts of water;
[0021] Among them, the inorganic acid is phosphoric acid; the dibasic carboxylic acid compound is an alkyl dibasic carboxylic acid compound; the water-soluble surfactant is a nonionic surfactant, specifically fatty acid polyoxyethylene alkyl ester; the stabilizer is a composite stabilizer , specifically a compound of triphenyl phosphite and zinc salt; the carrier of the catalyst is diatomaceous earth, and the catalytic active component is Ni; the oxidizing agent is selenium dioxide; and the buffering agent is an amino alcohol buffering agent....
Embodiment 2
[0026] A polishing agent for stainless steel materials of mechanical equipment, comprising the following components by weight: 20 parts of inorganic acid, 15 parts of dibasic carboxylic acid compound, 10 parts of calcium dihydrogen phosphate, 15 parts of water-soluble surfactant, 15 parts of glycerin, 20 parts of silicon oxide particles, 15 parts of stabilizer, 10 parts of catalyst, 10 parts of oxidant, 15 parts of buffer, 35 parts of water;
[0027] Among them, the inorganic acid is sulfuric acid; the dibasic carboxylic acid compound is an imino dibasic carboxylic acid compound; the water-soluble surfactant is a nonionic surfactant, specifically polyethylene glycol fatty acid ester; the stabilizer is a compound type The stabilizer is specifically a compound of triphenyl phosphite and zinc salt; the carrier of the catalyst is diatomite, and the catalytic active component is or Pd; the oxidizing agent is an organic peroxyacid; the buffer is ammonium bicarbonate buffer.
[0028]...
Embodiment 3
[0032] A polishing agent for stainless steel materials of mechanical equipment, comprising the following components by weight: 15 parts of inorganic acid, 13 parts of dibasic carboxylic acid compound, 8 parts of calcium dihydrogen phosphate, 13 parts of water-soluble surfactant, 10 parts of glycerin, 15 parts of silicon oxide particles, 13 parts of stabilizer, 7 parts of catalyst, 7 parts of oxidant, 12 parts of buffer, 30 parts of water;
[0033] Wherein, the inorganic acid is a mixture of sulfuric acid and hydrochloric acid with a mass ratio of 2:1; the dicarboxylic acid compound is an alkyl dicarboxylic acid compound and an iminodicarboxylic acid compound with a mass ratio of 1:3; the water-soluble surface active The agent is a nonionic surfactant, specifically a mixture of fatty acid polyoxyethylene alkyl ester and polyethylene glycol fatty acid ester with a mass ratio of 2:1; the stabilizer is a composite stabilizer, specifically triphenyl phosphite and The compound of zi...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com