Magnetron sputtering cluster ion source used for flight time mass spectrum

Abstract

The invention discloses a magnetron sputtering cluster ion source used for a flight time mass spectrum. The ion source comprises a cavity, an argon inlet pipe, a helium inlet pipe, a metal target material and a spraying opening. The metal target material is located on the side close to the flight time mass spectrum, and the argon inlet pipe and the helium inlet pipe are arranged at the two ends of the metal target material. The side, adjacent to the flight time mass spectrum, of the cavity is provided with the spraying opening protruding towards the cavity. According to the magnetron sputtering cluster ion source, the magnetron sputtering cluster ion source is combined with the flight time mass spectrum, when a sample is tested, argon enters the cavity through the argon inlet pipe and then is ionized, ionized argon ions rapidly bombard the surface of the metal target material to generate metal plasma which is carried by helium, the metal plasma is sprayed out from the spraying opening to form cluster ions which enter the high-resolution flight time mass spectrum, and finally a detector detects the ion cluster flight time mass spectrum with a quite wide size range.

Description

technical field [0001] The invention belongs to the field of ion sources, in particular to a magnetron sputtering cluster ion source for time-of-flight mass spectrometry. Background technique [0002] Atomic clusters or molecular clusters are material levels between single atoms or molecules and condensed states. It is of great theoretical and practical significance to study the physical and chemical properties of clusters of different sizes. Time-of-flight mass spectrometry has the advantages of fast analysis speed, wide analysis mass range, high resolution, and no mass upper limit. It is a powerful means to study clusters. Higher and higher, there is an urgent need for a stable and efficient ion source. [0003] The magnetron sputtering ion source can be used for the detection of metal cluster ions. The principle is to add an orthogonal magnetic field and electric field between the sputtered target (cathode) and the anode, and fill the high vacuum chamber with an inert ga...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a magnetron sputtering cluster ion source for time-of-flight mass spectrometry, which solves the problem of the small size of metal clusters in the past and the inability to accurately analyze the components of the same type of magnetron sputtering. The invention can be used for component analysis of various metal large-size cluster ions

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