Green organic light-emitting diode and manufacturing method thereof
An electroluminescence and green technology, applied in the field of green organic electroluminescence devices and their preparation, can solve the problem of high working voltage of light-emitting devices, and achieve the effects of alleviating insufficient capture capacity, balanced distribution and slow efficiency decay
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[0072] The present invention also provides a method for preparing a green organic light-emitting device described in the above technical solution, comprising the following steps:
[0073] providing an anode layer on the substrate;
[0074] On the surface of the anode layer, an anode modification layer, a hole transport-electron blocking layer, a hole-dominated light-emitting layer, an electron-dominated light-emitting layer, a hole block-electron transport layer, a cathode modification layer and a cathode layer are sequentially evaporated to obtain a green organic Light emitting devices.
[0075] The invention provides a substrate on which an anode layer is arranged. In the present invention, the substrate is consistent with the substrate described in the above technical solution, and will not be repeated here. In the present invention, it is preferable to etch the anode material provided on the substrate, form a plurality of thin strip electrodes on the substrate, and obtai...
Embodiment 1
[0093] First, the ITO anode layer on the ITO glass is laser-etched into a strip electrode, and then ultrasonically cleaned with cleaning solution and deionized water for 15 minutes and dried in an oven; then the dried substrate is placed in a pre-treatment vacuum Chamber, under the atmosphere with a vacuum degree of 10Pa, the ITO anode is subjected to low-pressure plasma treatment with a voltage of 400 volts for 3 minutes, and then transferred to the organic evaporation chamber;
[0094] In a vacuum of 1×10 -5 Pa~2×10 -5 In the organic evaporation chamber of Pa, 3nm thick MoO was sequentially evaporated on the ITO layer at a rate of 0.01nm / s 3 Anode modification layer 3; 40nm thick TAPC hole transport-electron blocking layer 4 evaporated at a rate of 0.05nm / s; Ir(ppy) evaporated at a rate of 0.0035nm / s 3 Evaporate TcTa at a rate of 0.05nm / s to obtain a 10nm thick hole-dominated light-emitting layer 5; 3 , Evaporating CzSi at a rate of 0.05nm / s to obtain a 10nm thick electron-...
Embodiment 2
[0102] First, the ITO anode layer on the ITO glass is laser-etched into strip electrodes, and then ultrasonically cleaned with cleaning solution and deionized water for 15 minutes and dried in an oven. Then put the dried substrate into the pretreatment vacuum chamber, and then transfer the ITO anode to the organic evaporation chamber after a 3-minute low-pressure plasma treatment with a voltage of 400 volts in an atmosphere with a vacuum degree of 10 Pa;
[0103] In a vacuum of 1×10 -5 Pa~2×10 -5 In the organic evaporation chamber of Pa, 3nm thick MoO was sequentially evaporated on the ITO layer at a rate of 0.01nm / s 3 Anode modification layer 3; 40nm thick TAPC hole transport-electron blocking layer 4 evaporated at a rate of 0.05nm / s; Ir(ppy) evaporated at a rate of 0.0035nm / s 3 Evaporate mCP at a rate of 0.05nm / s to obtain a 10nm thick hole-dominated light-emitting layer 5; 3 Evaporate 26DCzPPy at a rate of 0.05nm / s to obtain a 10nm-thick electron-dominated light-emitting...
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