High-hardness and low-stress multi-element composite diamond-like coating and preparation method thereof
A diamond coating and multi-component compounding technology, which is applied in the direction of metal material coating process, coating, ion implantation plating, etc., can solve the problems of hardness reduction and performance deterioration
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Embodiment 1
[0039] In Example 1, the coating on the surface of the Si substrate is a multi-component composite diamond-like coating. The multi-component composite diamond-like coating is composed of diamond-like, the first doping element Al and the second doping element is Cr element, referred to as Cr / Al multi-component composite diamond-like coating; and, in the multi-component composite diamond-like coating In the layer, the atomic percentage content of Al element is 4.69%, and the atomic percentage content of Cr element is 1.56%.
[0040] The above-mentioned Cr / Al multi-component composite diamond-like coating is prepared by using a linear ion beam composite magnetron sputtering coating equipment, which includes a vacuum chamber, a linear ion source, a magnetron sputtering source and a workpiece bracket , including the following steps:
[0041] Step 1. Clean the Si substrate:
[0042] Place the Si substrate on the workpiece holder of the vacuum chamber, and adjust the vacuum chamber a...
Embodiment 2
[0077] In Example 2, the coating on the surface of the Si substrate is a multi-component composite diamond-like coating. The multi-component composite diamond-like coating is composed of diamond-like, the first doping element Al and the second doping element is W element, referred to as W / Al multi-component composite diamond-like coating; and, in the multi-component composite diamond-like coating In the layer, the atomic percent content of Al element is 1.56%, and the atomic percent content of W element is 1.56%.
[0078] The above-mentioned W / Al multi-component composite diamond-like coating is prepared by using a linear ion beam composite magnetron sputtering coating equipment, which includes a vacuum chamber, a linear ion source, a magnetron sputtering source and a workpiece bracket , including the following steps:
[0079] Step 1. Clean the Si substrate:
[0080] Place the Si substrate on the workpiece holder of the vacuum chamber, and adjust the vacuum chamber air press...
Embodiment 3
[0096] In Example 2, the coating on the surface of the Si substrate is a multi-component composite diamond-like coating. The multi-component composite diamond-like coating is composed of diamond-like, the first doping element Cu, and the second doping element is Cr element, referred to as Cr / Cu multi-component composite diamond-like coating; and, in the multi-component composite diamond-like coating In the layer, the atomic percentage content of Cu element is 1.56%, and the atomic percentage content of Cr element is 1.56%.
[0097] The above-mentioned Cr / Cu multi-component composite diamond-like coating is prepared by using a linear ion beam composite magnetron sputtering coating equipment, which includes a vacuum chamber, a linear ion source, a magnetron sputtering source and a workpiece bracket , including the following steps:
[0098] Step 1. Clean the Si substrate:
[0099] Place the Si substrate on the workpiece holder of the vacuum chamber, and adjust the vacuum chambe...
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