(NH4)2V4O9 film and preparation method thereof

A 2V4O9 thin film technology, which is applied in the field of vanadate nanomaterial 2V4O9 thin film and its preparation, can solve the problems of not being able to directly form a film, and achieve the effect of low cost, excellent performance and unique shape

Active Publication Date: 2015-01-28
INST OF CHEM MATERIAL CHINA ACADEMY OF ENG PHYSICS
2 Cites 9 Cited by

AI-Extracted Technical Summary

Problems solved by technology

[0005] At present, scientists have prepared vanadates with different shapes and compositions, such as NH 4 V 4 o 10 Nanoflowers, AgVO 3 Nanobelt, Mn 2 V 2 o 7 Nano Gang, (NH 4 ) 2 V 3 o 8 Nanosheets, etc., but (NH 4 ) 2 V 4 o 9 The preparation of nanosheet structure has not been reported yet
M...
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Method used

[0075] In summary, the present invention discloses a method for preparing a (NH4)2V4O9 thin film with controllable thickness and morphology for the first time. The method is simple to operate, highly controllable and repeatable. The present invention can control (NH4)...
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Abstract

The invention discloses an (NH4)2V4O9 film and a preparation method thereof. According to the method, a one-step hydrothermal method is adopted, an aqueous solution serves as a reaction system in a specific airtight reactor, and the reaction system is heated to generate a high pressure, so that (NH4)2V4O9 films with controllable morphology and film thickness can be directly prepared on different substrates. The blank in preparation of the (NH4)2V4O9 film is filled, and the preparation method disclosed by the invention is easy to operate, high in controllability and high in repeatability. The (NH4)2V4O9 film prepared by the invention has huge application potentials in the electrochemical and optical fields.

Application Domain

Technology Topic

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  • (NH4)2V4O9 film and preparation method thereof
  • (NH4)2V4O9 film and preparation method thereof
  • (NH4)2V4O9 film and preparation method thereof

Examples

  • Experimental program(4)

Example Embodiment

[0062] Example 1:
[0063] Add 0.7mmol of tartaric acid and 60mL of deionized water into the reaction vessel and place it in an ultrasonic cleaner for 30 minutes, then add 5.6mmol of vanadium pentoxide to the reaction vessel and stir for 20 minutes, then add 3mL of directing agent 25% ammonia dropwise Stir and react for 50 minutes to obtain a precursor solution. Take 50 mL of the precursor solution and transfer it to a reactor with a 100 mL polytetrafluoroethylene liner. At the same time, put a piece of quartz substrate rinsed with deionized water into the reactor. In the bladder, seal the reaction kettle and let it stand for 5 hours, then put the reaction kettle in an oven and heat it to 180°C for 24 hours and cool it naturally. After opening the autoclave, take out the substrate and rinse it with deionized water once, then rinse once with ethanol, repeat the rinse three times, and dry it at 60°C for 8 hours to obtain (NH) deposited on the quartz substrate. 4 ) 2 V 4 O 9 film.
[0064] Such as figure 1 The XRD pattern analysis shows that this example has obtained the expected (NH 4 ) 2 V 4 O 9.
[0065] Such as figure 2 with image 3 As shown, the (NH 4 ) 2 V 4 O 9 The thickness of the film is about 40.21 microns, and the morphology is nano-sheet irregular (NH 4 ) 2 V 4 O 9 film.

Example Embodiment

[0066] Example 2
[0067] Add 0.7mmol of tartaric acid and 70mL of deionized water to the reaction vessel and place it in an ultrasonic cleaner for 30 minutes, then add 5.9mmol of vanadium pentoxide to the reaction vessel and stir for 30 minutes, then add 6mL of directing agent ammonia dropwise and stir. After reacting for 30 minutes, the precursor solution is obtained. Take 60 mL of the precursor solution and transfer it to a 100 mL polytetrafluoroethylene liner reactor. At the same time, put a piece of quartz substrate rinsed with deionized water into the reactor liner. After the reaction kettle is sealed, let it stand for 10 hours, and then put the reaction kettle in an oven to heat to 180°C for 24 hours, and cool naturally. After opening the autoclave, take out the substrate and rinse it with deionized water once, then rinse once with ethanol, repeat the rinse three times, and dry it at 60°C for 10 hours to obtain (NH 4 ) 2 V 4 O 9 film.
[0068] Such as Figure 4 with Figure 5 As mentioned, the (NH 4 ) 2 V 4 O 9 The film has a thickness of about 59.58 microns and a rosette-like multilayer structure (NH 4 ) 2 V 4 O 9 film.

Example Embodiment

[0069] Example 3
[0070] Add 0.73mmol of tartaric acid and 40mL of deionized water to the reaction vessel and place it in an ultrasonic cleaner for 20 minutes, then add 6.2mmol of vanadium pentoxide to the reaction vessel and stir for 25 minutes, then add 7mL of directing agent ammonia dropwise and stir. After reacting for 40 minutes, the precursor solution is obtained. Take 90 mL of the precursor solution and transfer it to a 100 mL polytetrafluoroethylene liner reactor. At the same time, put a piece of quartz substrate rinsed with deionized water into the reactor liner. After the reaction kettle is sealed, it is allowed to stand for 10 hours, and then the reaction kettle is placed in an oven and heated to 200°C for 24 hours and cooled naturally. After opening the autoclave, take out the substrate and rinse it with deionized water once, and then rinse once with ethanol. Repeat the rinse three times and dry it at 60°C for 10 hours to obtain (NH) deposited on the conductive glass substrate. 4 ) 2 V 4 O 9 film.
[0071] Such as Image 6 with Figure 7 As mentioned, the (NH 4 ) 2 V 4 O 9 The film is 76.19 microns thick, and the morphology is a closely packed nanosheet structure (NH 4 ) 2 V 4 O 9 film.
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PUM

PropertyMeasurementUnit
Thickness40.2µm
Thickness59.6µm
Thickness76.2µm
tensileMPa
Particle sizePa
strength10

Description & Claims & Application Information

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