Liner and substrate separation process and flexible display device and manufacturing process thereof
A flexible display and substrate technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as difficult to control the balance of adhesion, difficult separation process, flexible film substrate detachment, etc., to achieve increased Adhesion, simple separation process, and the effect of increasing the contact area
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Embodiment 1
[0032] The substrate and substrate separation process for the preparation of a flexible display device in this embodiment includes the following steps:
[0033] (1) Prepare a flexible film substrate on the substrate, the flexible film substrate is located on the substrate, and covers the side of the substrate, that is, covers the upper surface and the side of the substrate, and is partially covered;
[0034] The substrate is a hard material with a thickness of 1-2000 microns, which can be made of glass, metal, plastic and fiber, or a substrate based on the above materials with a buffer layer.
[0035] The material of the flexible film substrate 200 can be polyimide (Polyimide, PI), polyethylene terephthalate (Polyethylene terephthalate, PET), polyethylene naphthalate (Polyethylene naphthalate, PEN), polyethylene Carbonate (Polycarbonate, PC), polyethersulfone (Polyethersulfone, PES), polyacrylate (Polyacrylate, PAR), polyetherimide (Polyetherimide), polyamide (Polyamide, PA) o...
Embodiment 2
[0045] A substrate and substrate separation process for the preparation of a flexible display device in this embodiment, other features are the same as in Embodiment 1, except for the following features:
[0046] In the step (1) of this embodiment, when the flexible film substrate is prepared on the substrate, the flexible film substrate is located on the substrate, and covers the side surface and the lower bottom surface of the substrate, that is, covers the upper and lower bottom surfaces and the side surfaces of the substrate, that is, completely covered; the prepared structure as image 3 shown.
[0047] This structure can maximize the adhesion of the flexible film substrate to the substrate without changing the physical and chemical properties of the flexible film substrate, and reduce the probability of detachment.
[0048] After the device is fabricated, it can be dissociated by cutting.
[0049] Step (3) of the present embodiment is specifically as follows: as Figu...
Embodiment 3
[0052] The substrate and substrate separation process for the preparation of a flexible display device in this embodiment includes the following steps:
[0053](1) Prepare a sacrificial layer on the substrate, and then prepare a flexible film substrate on the sacrificial layer; the flexible film substrate covers the upper surface and side of the sacrificial layer, and the side of the substrate is a partially covered structure;
[0054] The sacrificial layer can be more than one of carbon single material film and nitride material film, and can be a single-layer structure or a multi-layer structure;
[0055] The carbon material is amorphous carbon, carbon nanotubes, graphene, fullerene or diamond-like carbon;
[0056] The nitride material is silicon nitride, aluminum nitride, gallium nitride or indium nitride.
[0057] The sacrificial layer can be prepared by any one of chemical vapor deposition, physical vapor deposition or solution processing.
[0058] (2) Electronic compone...
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