Method for preparing monodisperse size-controllable nanosilver particles by using radio frequency magnetron sputtering method

A radio frequency magnetron sputtering, nano silver particle technology, applied in nanotechnology, sputtering plating, ion implantation plating and other directions, can solve the problem of large dispersion of nanoparticles, poor directional growth of nanoparticles, particle shape and particle size distribution Non-uniformity and other problems, to achieve the effect of small deposition rate, uniform and tidy particles, and easy growth process

Active Publication Date: 2015-02-25
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Particles from a few nanometers to tens of nanometers can be prepared by controlling the evaporation parameters, but the obtained nanoparticles have poor directional growth, large dispersion of nanoparticles, and uneven particle shape and particle size distribution.

Method used

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  • Method for preparing monodisperse size-controllable nanosilver particles by using radio frequency magnetron sputtering method
  • Method for preparing monodisperse size-controllable nanosilver particles by using radio frequency magnetron sputtering method
  • Method for preparing monodisperse size-controllable nanosilver particles by using radio frequency magnetron sputtering method

Examples

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Embodiment 1

[0028] The purpose of this embodiment is to prepare monodisperse nano silver particles with a particle size of about 5 nanometers on a glass substrate by radio frequency magnetron sputtering. The process for preparing nano silver particle films by radio frequency magnetron sputtering is as follows figure 1 As shown, the preparation method specifically includes the following steps:

[0029] (1) Select 99.999% ultra-pure silver as the target material for magnetron sputtering, and put it into the magnetron sputtering chamber;

[0030] (2) Using glass as the substrate, ultrasonically clean the glass substrate with deionized water, acetone and isopropanol in sequence for 10 min, rinse thoroughly with deionized water, blow dry with nitrogen, and install it on the substrate table;

[0031] (3) Close the sputtering chamber and evacuate to 1×10 -7 ~9×10 -7 torr, use high-purity argon as the working gas, adjust the air pressure to 13mtorr, turn on the power source under the substrate ...

Embodiment 2

[0035] The purpose of this embodiment is to prepare monodisperse nano-silver particles with a particle size of about 10 nanometers on a glass substrate by radio frequency magnetron sputtering. The process for preparing nano-silver particle films by radio frequency magnetron sputtering is as follows figure 1 As shown, the preparation method specifically includes the following steps:

[0036] (1) Select 99.999% ultra-pure silver as the target material for magnetron sputtering, and put it into the magnetron sputtering chamber;

[0037] (2) Using glass as the substrate, ultrasonically clean the glass substrate with deionized water, acetone and isopropanol in sequence for 10 min, rinse thoroughly with deionized water, blow dry with nitrogen, and install it on the substrate table;

[0038] (3) Close the sputtering chamber and evacuate to 1×10 -7 ~9×10 -7 torr, use high-purity argon as the working gas, adjust the air pressure to 10mtorr, turn on the power source under the substrate...

Embodiment 3

[0042] The purpose of this embodiment is to prepare monodisperse nano-silver particles with a particle size of about 30 nanometers on a glass substrate by radio frequency magnetron sputtering. The process for preparing nano-silver particle films by radio frequency magnetron sputtering is as follows figure 1 As shown, the preparation method specifically includes the following steps:

[0043] (1) Select 99.999% ultra-pure silver as the target material for magnetron sputtering, and put it into the magnetron sputtering chamber;

[0044] (2) Using glass as the substrate, ultrasonically clean the glass substrate with deionized water, acetone and isopropanol in sequence for 15 minutes, rinse thoroughly with deionized water, blow dry with nitrogen, and install it on the substrate stage;

[0045] (3) Close the sputtering chamber and evacuate to 1×10 -7 ~9×10 -7 torr, use high-purity argon as the working gas, adjust the air pressure to 13mtorr, turn on the power source under the subst...

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Abstract

The invention relates to a method for preparing monodisperse size-controllable nanosilver particles by using a radio frequency magnetron sputtering method. The monodisperse size-controllable nanosilver particles are prepared by using the radio frequency magnetron sputtering method under the condition that the basal spur of an equipment target is fixed by means of adjusting the process parameters such as vacuum degree, working air pressure, radio-frequency power, substrate temperature, deposition time and the like by selecting 99.999% superfine silver as a magnetron sputtering target, glass or silicon as a substrate and high purity argon (Ar) as working gas. The method which is a pure physical method has the advantages of being zero in pollution, low in cost, repeatable in operation, small in deposition rate, easily precise in control in the growth process and the like, and the prepared nanosilver particles are uniform and neat and particle size-controllable.

Description

technical field [0001] The invention belongs to a method for preparing a metal nanoparticle film, and in particular relates to a method for preparing monodisperse and size-controllable nano silver particles by using a radio frequency magnetron sputtering method. Background technique [0002] Nanoparticles have a large specific surface area, and the number of surface atoms, surface energy and surface tension increase sharply with the reduction of particle size, showing the characteristics of small size effect, surface effect, quantum effect and macroscopic quantum tunneling effect, which lead to different The thermal, magnetic, light-sensitive properties and surface stability of conventional particles have very important application value in many fields. Due to the high surface activity and catalytic properties of nano-silver, it has very broad application prospects in many fields such as electricity, heat, optics, and catalysis. Nano-silver can be used not only as conductiv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/14B82Y40/00
CPCB82Y40/00C23C14/14C23C14/35
Inventor 闫兰琴褚卫国宋志伟张先锋
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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