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A fine metal mask plate for ultra-high resolution evaporation and its manufacturing method

A fine metal mask, ultra-high resolution technology, applied in vacuum evaporation coating, metal material coating process, sputtering coating and other directions, can solve problems such as easy cracking, limit mask resolution, etc. The effect of cracking, improving the resolution of evaporation, and significant industrial application value

Active Publication Date: 2017-07-04
SHANGHAI UNIV OF ENG SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this technology, Invar rib (Invar rib in English) is used as the support of the mask, and the thickness of the PI layer is 6-10 μm. Due to the existence of Invar rib, the opening size of the PI mask sheet is limited, thus limiting the mask plate. resolution
In addition, because the PI film is very thin, it is easy to break when punching holes

Method used

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  • A fine metal mask plate for ultra-high resolution evaporation and its manufacturing method
  • A fine metal mask plate for ultra-high resolution evaporation and its manufacturing method
  • A fine metal mask plate for ultra-high resolution evaporation and its manufacturing method

Examples

Experimental program
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Effect test

Embodiment 1

[0030] Such as figure 1 As shown, a kind of fine metal mask plate for ultra-high resolution evaporation provided in this embodiment includes an upper magnetic film layer 1, a lower magnetic film layer 2 and a graphene and / or graphene derivative intermediate layer 3, the upper The magnetic film layer 1, the graphene and / or graphene derivative intermediate layer 3 and the lower magnetic film layer 2 are sequentially stacked to form a sandwich structure.

[0031] Described graphene and / or graphene derivative intermediate layer 3 can adopt roll-to-roll (English is roll toroll, be called for short R2R) method to be laminated on the surface of lower magnetic film layer 2, and upper magnetic film layer 1 can also pass through The lamination method is attached to the surface of the graphene and / or graphene derivative intermediate layer 3, and then the ends of the upper magnetic film layer 1 and the lower magnetic film layer 2 are bonded or welded as one, and then laser-printed hole o...

Embodiment 2

[0035] Such as image 3 As shown, the difference between this embodiment and Embodiment 1 is only that the upper magnetic film layer 1 and the lower magnetic film layer 2 are made of different materials; the upper magnetic film layer 1 is a polyimide film added with soft magnetic metal powder , the lower magnetic film layer 2 is an Invar alloy film, and the soft magnetic metal powder is selected from at least one of Fe, Co, and Ni metal powders. When making through holes, the upper and lower magnetic film layers and the middle layer of graphene and / or graphene derivatives are drilled by laser.

Embodiment 3

[0037] Such as Figure 4 As shown, the difference between this embodiment and Embodiment 1 is only that the upper magnetic film layer 1 and the lower magnetic film layer 2 are made of different materials; the upper magnetic film layer 1 is an Invar alloy film, and the lower magnetic film layer 2 is an additive A polyimide film with soft magnetic metal powder, wherein the soft magnetic metal powder is selected from at least one of Fe, Co and Ni metal powders. When making through holes, the upper magnetic film layer 1 is drilled by wet etching, and the lower magnetic film layer and the middle layer of graphene and / or graphene derivatives are drilled by laser.

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Abstract

The invention discloses a fine metal mask plate for ultra-high resolution vapor deposition and a manufacturing method thereof. Described fine metal mask plate comprises upper and lower two magnetic film layers and graphene and / or graphene derivative middle layer, described upper and lower two magnetic film layers and graphene and / or graphene derivative middle layer Layers are stacked in sequence to form a sandwich structure; or, the upper and lower magnetic film layers form an encapsulation structure for the middle layer of graphene and / or graphene derivatives. In the present invention, by using the upper and lower magnetic film layers and the middle layer of graphene and / or graphene derivatives to form a mask plate, finer through holes can be made, and the through hole density per unit area can be greatly improved, so that The method can significantly improve the evaporation resolution of the mask plate, and can make the resolution of the produced OLED display screen exceed 400PPI, and has significant industrial application value.

Description

technical field [0001] The invention relates to a fine metal mask plate for ultra-high resolution evaporation and a manufacturing method thereof, and belongs to the technical field of light-emitting diode display manufacturing. Background technique [0002] Organic Light Emitting Diode (OLED for short) is a new generation of display technology and lighting technology with huge application prospects. Generally, the light-emitting layer of the OLED screen is formed by evaporating organic materials through a fine metal mask (referred to as FMM). FMM usually consists of a 30-50 micron thick Invar alloy sheet (English is invarsheet or invar, Invar alloy is an iron alloy containing 35.4% nickel. When the ambient temperature is -20°C to 20°C, the average thermal expansion coefficient is about 1.6×10 -6 / °C), through wet etching a slit (slit in English) or slot (slot in English) type opening pattern, and then bound to the metal mask frame (mask frame in English). Due to the limit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/24H01L51/56
CPCC23C14/042C23C14/24H10K71/00
Inventor 张霞于治水姚宝殿
Owner SHANGHAI UNIV OF ENG SCI
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