Diamond grinding pad for processing super-hard ceramics and preparation method for diamond grinding pad
A diamond and grinding pad technology, which is applied in the field of research and development of ceramic processing devices, can solve the problems of difficult to meet product dimensional accuracy, poor product surface quality, and difficult to meet dimensional accuracy, etc., to achieve heat dissipation and chip removal, consistent size, Good stability of grinding force
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[0041] Example 1
[0042] Such as figure 1 As shown, the present invention provides a diamond polishing pad for processing superhard ceramics. The polishing pad includes a diamond material layer 1, and the diamond material layer 1 includes a square abrasive block layer 11 and a flat layer 12. From one side of the diamond polishing pad to the other side, it includes: a square abrasive block layer 11, a flat layer 12, a non-woven fabric layer 2, an adhesive layer 3, a PET film layer 4, and a PC with double-sided adhesive Layer 5. figure 1 Among them, 51 is the double-sided adhesive layer on the PC board layer with double-sided adhesive. The diamond material layer is made of the following raw materials in mass percentages: resin binder 35%, diamond 10%, wollastonite 50%, molybdenum disulfide 3%, and fumed silica 2%.
[0043] The method for preparing the above-mentioned diamond polishing pad for processing superhard ceramics includes the following steps:
[0044] Step 1: Mixing: Weigh ...
Example Embodiment
[0055] Example 2
[0056] The structure of the diamond polishing pad in Example 2 is the same as that in Example 1, but the ingredients for preparing the diamond material layer are: resin binder 25%, diamond 20%, wollastonite 40%, molybdenum disulfide 10%, gas phase Silica 5%.
Example Embodiment
[0057] Example 3
[0058] The structure of the diamond polishing pad in Example 3 is the same as that in Example 1, but the ingredients for preparing the diamond material layer are: resin binder 50%, diamond 5%, wollastonite 43.5%, molybdenum disulfide 1%, gas phase Silica 0.5%.
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