Composition, black matrix and preparation method thereof, display devices
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- BEIJING SINEVA TECH
- Publication Date
- 2015-07-29
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the field of liquid crystal display, in particular to a black photoresist composition, a black matrix and a preparation method, an OLED display device, an LCD display device and a flexible display device. Background technique
[0002] The black matrix is used for shading in the traditional liquid crystal display field. In its traditional preparation method, the post-baking operation temperature is controlled at more than 230°C to completely polymerize the monomers in the black photoresist composition and completely cure the black light-shielding film, thereby ensuring black Film-forming stability, alkali resistance and chemical resistance of the matrix.
[0003] However, the traditional high-temperature post-baking preparation method has the following problems:
[0004] (1) The high-temperature post-baking method reduces the resistance of the black matrix. If the resistance of the black matrix is too low, the orientation o...