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Composition, black matrix and preparation method thereof, display devices

A display device and composition technology, which is applied to opto-mechanical equipment, photo-engraving process of pattern surface, optics, etc., can solve the problem of high post-baking temperature, low black matrix resistance, post-baking temperature that cannot be used in OLED display devices and Flexible display devices and other problems, to achieve the effect of complete polymerization, overcoming undercutting, and stable cured film

Inactive Publication Date: 2015-07-29
BEIJING SINEVA TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The invention provides a black photoresist composition to solve the problem of high post-baking temperature in the black matrix preparation method in the prior art; it provides a low-temperature post-baking preparation method for the black matrix, which solves the problem in the prior art due to The problem of the low resistance of the black matrix caused by the high post-baking temperature, and the problem that the prior art cannot be used for OLED display devices and flexible display devices due to the high post-baking temperature, and provides a black matrix obtained according to the preparation method , and an OLED display device, a flexible display device and an LCD display device comprising the black matrix

Method used

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  • Composition, black matrix and preparation method thereof, display devices
  • Composition, black matrix and preparation method thereof, display devices

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preparation example Construction

[0034] According to another aspect of the present invention, a method for preparing a black matrix is ​​provided. The composition according to the present invention is used to prepare a black matrix, wherein the method includes: pre-baking operation: baking at 40°C to 65°C for 110 ~300 seconds; post-baking operation: bake at 80°C-180°C for 60-120 minutes.

[0035]According to the preparation method of the black matrix of the present invention, firstly, the evenly stirred black photoresist composition is uniformly coated on a clean glass substrate, and most of the solvent is removed in the pre-baking step, and the pre-baking temperature is reduced to 40° C. to 65° C., and further Preferably 45°C to 60°C, the baking time is 110 to 300 seconds, more preferably 180 to 250 seconds, the pre-baking temperature can be adjusted according to the decomposition temperature of the thermal initiator, generally 10°C to 10°C lower than the decomposition temperature of the initiator 80°C to pr...

Embodiment 1

[0046] The black photoresist composition according to the present invention comprises: 30 parts of monomer solids, 25 parts of resin solids, 20 parts of black pigment liquid solids, 6 parts of initiators and 5 parts of auxiliary agents; wherein, the initiators include thermal initiators And photoinitiator, the mass ratio of thermal initiator and photoinitiator is 1:10, and photoinitiator is 1-[4-(phenylthio) phenyl]-1,2-octanedione-2-(O- Benzoyl oxime), thermal initiator is azobisisobutyronitrile of azo initiator; resin is acrylate resin, molecular weight is 13000, 8000 or 9000, acid value is 120, 70 or 80; monomer is Dipentaerythritol hexaacrylate; the auxiliary agent is pentaerythritol tetra-3 mercaptoacrylate.

[0047] The composition was dissolved in propylene glycol methyl ether acetate, and evenly coated on a clean glass substrate, the pre-baking temperature was 40°C, and the baking time was 110 seconds; after the pre-baking step was completed, the glass substrate was co...

Embodiment 2

[0049] The black photoresist composition according to the present invention comprises: 35 parts of monomer solids, 35 parts of resin solids, 30 parts of black pigment liquid solids, 20 parts of initiators and 10 parts of auxiliary agents, wherein the initiators include thermal initiators And photoinitiator, the mass ratio of thermal initiator and photoinitiator is 3:1, and photoinitiator is 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl ] ethyl ketone-1-(O-acetyl oxime), thermal initiator is diisopropyl peroxydicarbonate of organic peroxygen initiator; Resin is acrylic ester resin, and the molecular weight of acrylic resin is 13000,8000 or 9000, the acid value is 120, 70 or 80; the monomer is dipentaerythritol hexaacrylate; the auxiliary agent is pentaerythritol tetra-3 mercaptoacrylate;

[0050] Dissolve the above composition in propylene glycol methyl ether, and evenly coat it on a clean glass substrate. The pre-baking temperature is 65°C, and the baking time is 300 seconds...

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Abstract

The invention discloses a black photoresist composition, a black matrix and a preparation method thereof, an OLED display device, an LCD display device and a flexible display device. The black photoresist composition comprises the following components: 30-35 parts of a monomer solid substance, 25-35 parts of a resin solid substance, 20-30 parts of a black liquid pigment solid substance, 6-20 parts of initiating agents and 5-10 parts of additives, wherein the initiating agents comprise thermal initiating agents and a photoinitiator. The black matrix is prepared from the black photoresist composition. Each of the OLED display device, the LCD display device and the flexible display device comprises the black matrix. When the black photoresist composition is used for preparation of the black matrix and the post-baking operation is cooled to 180 DEG C or lower, the prepared black matrix is 7 magnitudes higher than the conventional black matrix, and can be applied to the OLED display device, the LCD display device and the flexible display device.

Description

technical field [0001] The invention relates to the field of liquid crystal display, in particular to a black photoresist composition, a black matrix and a preparation method, an OLED display device, an LCD display device and a flexible display device. Background technique [0002] The black matrix is ​​used for shading in the traditional liquid crystal display field. In its traditional preparation method, the post-baking operation temperature is controlled at more than 230°C to completely polymerize the monomers in the black photoresist composition and completely cure the black light-shielding film, thereby ensuring black Film-forming stability, alkali resistance and chemical resistance of the matrix. [0003] However, the traditional high-temperature post-baking preparation method has the following problems: [0004] (1) The high-temperature post-baking method reduces the resistance of the black matrix. If the resistance of the black matrix is ​​too low, the orientation o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/038G02B5/20G02B1/04
Inventor 赵林玲
Owner BEIJING SINEVA TECH
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