Device for common voltage high voltage radio cooperation radio frequency glow jet discharge and discharge method

A jet discharge and radio frequency technology, applied in the direction of plasma, can solve the problems of low plasma temperature and low plasma density, and achieve the effect of less discharge pollution, abundant sources and increased concentration

Inactive Publication Date: 2015-09-16
DONGHUA UNIV
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  • Abstract
  • Description
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Problems solved by technology

The discharge breakdown voltage and sustain voltage are generally greater than kilovolts (kV), the plasma temperature obtained by discharge is low (close to room temperature), and its

Method used

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  • Device for common voltage high voltage radio cooperation radio frequency glow jet discharge and discharge method
  • Device for common voltage high voltage radio cooperation radio frequency glow jet discharge and discharge method
  • Device for common voltage high voltage radio cooperation radio frequency glow jet discharge and discharge method

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Embodiment

[0020] Such as figure 1 As shown, a discharge tube body 1 is included. One end of the discharge tube body 1 is an air inlet 5 and the other end is an air outlet 6. The discharge tube body 1 is sequentially provided with three groups of electrodes, a first group of electrodes 2, a common electrode 3, and a second group of electrodes 4. The first group of electrodes 2 is connected to a high voltage source, the common electrode 3 is grounded, and the second group of electrodes 4 is connected to a radio frequency source. The radio frequency source adopts alternating current with a frequency of 2MHz-100MHz and a power of 5W-1000W; the high-voltage source is a direct-current pulse or high-voltage alternating current source with a frequency of 1Hz-1KHz and a power of 30W-1000W. The discharge tube body 1 adopts a quartz tube with a circular cross-section, with an inner diameter of 6mm, a wall thickness of 1mm, and a length of 450mm; the dimensions of the three groups of electrodes are a...

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Abstract

The invention discloses a device for common voltage high voltage radio cooperation radio frequency glow jet discharge and a discharge method. The device comprises a discharge tube body; a first group electrode, a common electrode, a second group electrode and a third group electrode are successively arranged on the discharge tube; and the first group electrode is connected to a high voltage source, the common electrode is connected to the ground and the second group electrode is connected to a radio frequency source. The discharge method comprises steps of introducing a reaction gas into the dielectric barrier to go into the discharge tube body from a gas inlet, utilizing high voltage to assist radio frequency to discharge to generate a plasma jet, discharging through high voltage dielectric barrier glowing, utilizing the electrons, ions and excited state particles in the generated plasma body to assist the radio frequency dielectric barrier glow to discharge and glow and to reduce the glow voltage of radio frequency discharge. The invention can discharge and glow through high voltage source electrode group, utilizes the generated plasma body to assist the common voltage radio frequency to discharge and glow and obtains the common voltage jet plasma body which is high in density, in activity and controllable in the gas temperature.

Description

Technical field [0001] The present invention relates to the technical field of atmospheric pressure glow discharge, in particular to a device and a discharge method for atmospheric pressure and high voltage coordinated radio frequency glow jet discharge. Background technique [0002] Glow discharge is the most common form of discharge in discharge plasma. It is named after the unique glow that appears in the tube during discharge and is also the most widely used. Normal pressure glow discharge is a kind of low temperature plasma generated under normal pressure. Because it eliminates the expensive vacuum system, the discharge is uniform and soft, and various active particles for plasma applications can be obtained at a lower temperature. The surface characteristics of the processed materials provide a new high-efficiency, low-temperature processing technology, which has huge application prospects in the fields of film preparation, material surface modification, sterilization, and ...

Claims

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Application Information

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IPC IPC(8): H05H1/46
Inventor 郭颖赵文亮张杰石建军张菁
Owner DONGHUA UNIV
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