Light-absorbing layer system, the production thereof and sputter target suitable therefor
A technology for sputtering target materials and light-absorbing layers, which is applied in the production of the layer system and the field of sputtering target materials, and can solve problems such as toxic Cr-Vl compounds
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example 1
[0096] With an average grain size of 25 μm, consisting of 89.3% by weight Nb 2 o 4.99 and a powder mixture consisting of 10.7 wt% Mo were vigorously mixed in a swing mixer for 1 hour, thereby 2 o 4.99 A fine and monodisperse distribution of Mo particles is produced in . Subsequently, the mixture was filled into a graphite mold having a diameter of 75 mm and a height of 15 mm. The round billets were densified to greater than 85% of theoretical density by hot pressing at 1200 °C and 30 MPa under reducing conditions. The resulting structure consists of Nb 2 o 4.99 Composition of a matrix in which Mo particles having an average grain size of 25 μm are embedded.
[0097] A similar method was used to produce Nb with 64 wt% 2 o 4.99 and a second sputtering target of 36% by weight Mo. In this case, Mo powders with a grain size of <10 μm are selected for producing a particularly homogeneous Mo distribution.
[0098] The sputtering target has a specific resistance of less than...
example 2
[0129] In order to examine the effect of oxygen stoichiometry on optical and electrical properties, in another test a sputtering target of metallic niobium was incorporated into an in-line sputtering system (code: A700V) from Leybold, and At different partial pressures of oxygen through an alkali-free glass (AF32, size 50x50mm) with a layer thickness of about 100 nm 2 ) to produce a niobium oxide layer by reactive DC sputtering.
[0130] exist Figure 6 In the diagram of , the development of the generator voltage U in [V] (upper curve U) is plotted on the left ordinate axis and the dependence of the oxygen supply q in [sccm] on the right ordinate O2 The oxygen partial pressure p in the unit of [mPa] in the sputtering chamber O2 (lower curve p O2 ). Thus, an oxygen supply in the range of 18-20 sscm, equal to an oxygen partial pressure of about 60-70 mPa, leads to saturation (full oxidation mode) and to a maximum value of the generator voltage. Thus, the metal target used f...
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