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Hydrogenation reduction device for high-purity arsenic production and high-purity arsenic preparing method

A high-purity arsenic and hydrogen technology, applied in the field of high-purity arsenic, can solve the problems that the high-purity arsenic industry has not achieved a large scale and the market demand is not large, and achieve the effect of improving purity and yield and prolonging contact time

Active Publication Date: 2015-10-14
威科赛乐微电子股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the small market demand, the high-purity arsenic industry did not achieve great development. Until the end of the last century, with the continuous discovery of special properties such as high-strength corrosion resistance and high electron migration of gallium arsenide, gallium arsenide was widely used. The importance of high-purity arsenic is widely recognized in the fields of optoelectronics and microelectronics such as optical fiber communication, mobile communication, space technology, aerospace, and military affairs, and the high-purity arsenic industry is also booming.

Method used

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  • Hydrogenation reduction device for high-purity arsenic production and high-purity arsenic preparing method
  • Hydrogenation reduction device for high-purity arsenic production and high-purity arsenic preparing method
  • Hydrogenation reduction device for high-purity arsenic production and high-purity arsenic preparing method

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preparation example Construction

[0054] The invention provides a method for preparing high-purity arsenic, comprising the following steps:

[0055] Pass arsenic trichloride and hydrogen gas into the feed pipe of the hydrogenation reduction tube of the device described in the above technical scheme, the arsenic trichloride and hydrogen gas are heated and reacted in the reaction section of the hydrogenation reduction tube, and a solid high temperature is obtained in the deposition section. pure arsenic.

[0056] In the present invention, arsenic trichloride and hydrogen are first passed into the feed pipe of the hydrogenation reduction device. The hydrogenation-reduction device includes: a hydrogenation-reduction tube, the feed end of the hydrogenation-reduction tube is provided with a feed tube; the interior of the hydrogenation-reduction tube is followed by a reaction section and a deposition section along the direction of its gas flow; the reaction section The outlet end of the gas outlet is provided with a...

Embodiment 1

[0066] Hydrogen reduction unit

[0067] a kind of like figure 1 The hydrogenation reduction unit shown, figure 1 It is a structural schematic diagram of the hydrogenation reduction device provided by the embodiment of the present invention. figure 1 Among them, 1 is a hydrogenation reduction tube, 2 is a feed tube, 3 is a return tube, 4 is a partition with holes, 1-1 is a reaction section, and 1-2 is a deposition section.

[0068] The hydrogenation reduction device provided in this embodiment includes a hydrogenation reduction tube 1 , the axial length of the hydrogenation reduction tube is 2200 mm, the outer diameter is 120 mm, and the wall thickness is 3 mm. The feed end of the hydrogenation reduction tube 1 is provided with a feed tube 2 with an outer diameter of 10 mm and a wall thickness of 2 mm. Inside the hydrogenation-reduction tube 1 along the forward direction of its gas flow are the reaction section 1-1 and the deposition section 1-2. The axial length of the reac...

Embodiment 2

[0071] Hydrogen reduction unit

[0072] a kind of like Figure 5 The hydrogenation reduction unit shown, Figure 5 It is a structural schematic diagram of the hydrogenation reduction device provided by Example 2 of the present invention. Figure 5 Among them, 1 is the hydrogenation reduction pipe, 2 is the feed pipe, 3 is the return pipe, 4 is the partition with holes, 5 is the deposition pipe, 7 is the flange, 1-1 is the reaction section, 1-2 is the deposition section .

[0073] The hydrogenation reduction device provided in this embodiment includes a hydrogenation reduction tube 1 , the axial length of the hydrogenation reduction tube is 2200 mm, the outer diameter is 120 mm, and the wall thickness is 3 mm. The feed end of the hydrogenation reduction tube 1 is provided with a feed tube 2 with an outer diameter of 10 mm and a wall thickness of 2 mm. Inside the hydrogenation-reduction tube 1 along the forward direction of its gas flow are the reaction section 1-1 and the d...

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Abstract

The invention belongs to the field of high-purity arsenic and particularly relates to a hydrogenation reduction device for high-purity arsenic production and a high-purity arsenic preparing method. The hydrogenation reduction device for high-purity arsenic production comprises a hydrogenation reduction pipe. A feed pipe is arranged at the feed end of the hydrogenation reduction pipe. A reaction section and a deposition section are arranged inside the hydrogenation reduction pipe in sequence in the airflow advancing direction. A partition board with a hole is arranged at the air outlet end of the reaction section. A return pipe with an opening facing the feed end of the hydrogenation reduction pipe is arranged on the reaction section. The return pipe is fixed to the partition board. The discharge end of the feed pipe stretches into the return pipe. The air outlet end of the deposition section is located at the air outlet end of the hydrogenation reduction pipe. According to the hydrogenation reduction device for high-purity arsenic production, the return pipe is arranged on the reaction section of the hydrogenation reduction pipe, in this way, the contact duration of arsenic trichloride and hydrogen is prolonged, the purity of products is improved, and the yield of the products is increased.

Description

technical field [0001] The invention belongs to the field of high-purity arsenic, and in particular relates to a hydrogenation reduction device for high-purity arsenic production and a high-purity arsenic preparation method. Background technique [0002] High-purity arsenic is a kind of high-purity (purity greater than 99.999%) arsenic, which is silver-gray metal crystal, brittle and hard, with metallic luster, easy to oxidize in humid air, and is a toxic product. High-purity arsenic is mainly used to prepare semiconductor compounds and high-purity alloys such as gallium arsenide, gallium aluminum arsenide, and indium arsenide. , has quite a wide range of uses. Gallium arsenide is the second-generation semiconductor material after monocrystalline silicon. It is currently the most important and most promising compound semiconductor material. It is also the most extensively studied and widely used semiconductor material by scientists. Gallium arsenide is widely used in the p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22B30/04
Inventor 何志达胡生海朱刘郭金伯杨林锟
Owner 威科赛乐微电子股份有限公司
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