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Production method of cylindrical titanium sputtering target material

A technology of sputtering target material and production method, which is applied in the production field of titanium target material, can solve the problems of low target material quality, achieve the effects of low purity of finished products, stable and reliable production quality, and simple production process

Inactive Publication Date: 2015-12-16
YUNNAN TITANIUM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although some domestic research institutes and manufacturers have developed and trial-produced targets, high-quality targets are still in the stage of theoretical research and trial production, and the quality of targets actually produced is relatively low, and a large number of high-quality targets still need import

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] (1) The titanium sponge with a purity of more than 99.9% produced by the iodination method is used as a raw material; the titanium sponge is loaded into the feeder of the electron beam cold bed furnace, that is, in the Archimedes spiral tube, and the feeder is loaded into the electron beam In the feeding system of the cooling hearth furnace, vacuumize the feeding system and smelting system of the electron beam cooling hearth furnace, and set the scanning pattern of the electron gun. When the vacuum degree of the feeding system is ≤0.2Pa and the main melting When the vacuum degree of the chamber is ≤0.02Pa, open the feeding system to add the sponge titanium material to the smelting cooling bed in the main smelting chamber, and turn on the electron gun for smelting. The melting power of the electron gun is controlled at 1000kW, and the power of the primary refining cooling bed is 200kW. The power of the crystal pulling crucible is 400kW, the pulling speed of the crystal pu...

Embodiment 2

[0027] (1) The titanium sponge with a purity of more than 99.9% produced by the iodination method is used as a raw material; the titanium sponge is loaded into the feeder of the electron beam cold bed furnace, that is, in the Archimedes spiral tube, and the feeder is loaded into the electron beam In the feeding system of the cooling hearth furnace, vacuumize the feeding system and smelting system of the electron beam cooling hearth furnace, and set the scanning pattern of the electron gun. When the vacuum degree of the feeding system is ≤0.2Pa and the main melting When the vacuum degree of the chamber is ≤0.02Pa, open the feeding system to add sponge titanium material to the smelting cooling bed in the main smelting chamber, and turn on the electron gun for smelting. The melting power of the electron gun is controlled at 1200kW, and the power of the primary refining cooling bed is 250kW. The power of the crystal pulling crucible is 500kW, the pulling speed of the crystal pullin...

Embodiment 3

[0034](1) The titanium sponge with a purity of more than 99.9% produced by the iodination method is used as a raw material; the titanium sponge is loaded into the feeder of the electron beam cold bed furnace, that is, in the Archimedes spiral tube, and the feeder is loaded into the electron beam In the feeding system of the cooling hearth furnace, vacuumize the feeding system and smelting system of the electron beam cooling hearth furnace, and set the scanning pattern of the electron gun. When the vacuum degree of the feeding system is ≤0.2Pa and the main melting When the vacuum degree of the chamber is ≤0.02Pa, open the feeding system to add the sponge titanium material to the smelting cooling bed in the main smelting chamber, turn on the electron gun for smelting, the melting power of the electron gun is controlled at 900kW, the power of the primary refining cooling bed is 150kW, and the main refining cooling bed The power of the crystal pulling crucible is 300kW, the pulling...

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Abstract

The invention discloses a production method of a cylindrical titanium sputtering target material. Sponge titanium produced by an iodide process and having a purity above 99.9% is used as a raw material, and is smelted by an electron beam cold bed furnace to obtain a high-purity titanium blank (purity above 99.95%); after the titanium blank is milled the surface and finely polished, the head of a titanium billet is cut to form the requested size of the forged blank; the flaw detection is performed for the forged blank; the qualified forged blank is heated to 980-1020 DEG C; the forged blank is forged through three-upsetting and three-pulling; the forging mold is forged to a rod with needed specification in final pulling; after the forging is annealed, the surface scale of the rod is turned off; after forging caps at two ends are removed, the rod is sawed to a small cylinder block with needed specification; two sawed end surfaces of the small cylinder block are polished; the bottom is internally turned and milled to reserve an edge; the reserved edge is chamfered; the other end is threaded; and the cylindrical titanium sputtering target material is obtained through further cleaning. The purity of the target material produced by the method is not lower than 99.95%, and the grain size is controlled below 100 microns, so that the technical requirements of the sputtering target material can be satisfied.

Description

technical field [0001] The invention relates to the technical field of a production method of a titanium target. Background technique [0002] The sputtering method is one of the main technologies for preparing thin film materials, and the raw material for sputtering deposited thin films is the target material. The film deposited by sputtering with the target has high density and good adhesion. Since the 1990s, new devices and new materials in the microelectronics industry have developed rapidly. Electronics, magnetism, optics, optoelectronics and superconducting thin films have been widely used in high-tech and industrial fields, prompting the expansion of the sputtering target market. Today, the target material has flourished into a specialized industry. [0003] Pure titanium sputtering targets are developed in the emerging fields of decorative coatings, mold coatings, glass coatings, semiconductor device coatings, electronic device coatings, and flat display coatings. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/14
Inventor 黄海广曹占元李志敏史亚鸣黄晓慧王举李玉清陶虹
Owner YUNNAN TITANIUM IND
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