The invention discloses a preparation method of a high-purity
molybdenum plate for a target material. A
molybdenum alloy with the purity of 99.9% or above is produced by using a
sputtering method as araw material, a high-purity
molybdenum workblank is obtained by
smelting by adopting an
electron beam cooling
bed furnace, wherein the purity of the high-purity molybdenum workblank is 99.9% or above, the surface of the molybdenum workblank is milled, after finely
grinding is performed,
cropping is performed on a molybdenum square billet, then the
forging workblank is
cut into the required size,and flaw detection is performed on the forged workblank, the qualified forged workblank is heated to 980-1020 DEG C,
forging is performed on the forged workblank by adopting a three-upsetting and three-drawing method, and the
forge piece is made into a required specification bar in a die
forging mode during final drawing, after annealing is performed on the
forge piece, the
oxide skin on the surface of the bar is removed, and then sawing is performed to form small column blocks with the required specifications after forged caps of the two heads are removed; and two sawing end surfaces of the small column blocks are polished by lathe
machining, turn milling is performed on the inner bottom, an edge is reserved, and the reserved edge is chamfered, and thread
machining is further performed onthe other end part to obtain the cylindrical molybdenum
sputtering target material after further clearing. According to the preparation method, the purity of the produced target material is not lessthan 99.8%, the grain size is controlled to be 100 micron or below, and the technical requirements of the
sputtering target materials can be met.