A method for removing impurity iron in polysilicon and single crystal silicon wire cutting waste
A technology for cutting waste and polysilicon, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve problems such as low practicability, high process operation requirements, environmental pollution, etc., achieving low pollution, stable process parameters, The effect of simple process flow
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Embodiment 1
[0045] Add water to monocrystalline silicon and polycrystalline silicon wire cutting waste slurry, the liquid-solid ratio is 4:1, stir to remove polyethylene glycol, after stirring for 3 hours (this process can be carried out at room temperature), filter (this process It can be repeated 3 times to completely remove the polyethylene glycol), and the filter cake is dried. The dried filter cake was put into a ball mill and ground for 20 minutes to obtain a mixed powder of silicon and silicon carbide.
[0046]Mix silicon, silicon carbide powder and water at a ratio of 5:1, stir for 30 minutes and then let stand for 5 hours, the solution is layered, and the upper layer solution is filtered and dried to obtain a silicon-rich phase powder. Mix the silicon-rich phase powder and water at a ratio of 10:1 and stir evenly, adjust the pH value to 12 with 6% ammonia solution of ammonium tartrate, continue stirring for 10 minutes, and put it into an ultrasonic wave for 40 minutes.
[0047] ...
Embodiment 2
[0049] Add water to monocrystalline silicon and polycrystalline silicon wire cutting waste slurry, the liquid-solid ratio is 5:1, stir to remove polyethylene glycol, after stirring for 3 hours (this process can be carried out at room temperature), filter (this process It can be repeated 3 times to completely remove the polyethylene glycol), and the filter cake is dried. The dried filter cake was put into a ball mill and ground for 20 minutes to obtain a mixed powder of silicon and silicon carbide.
[0050] Mix silicon, silicon carbide powder and water at a ratio of 5:1, stir for 30 minutes and then let stand for 5 hours, the solution is layered, and the upper layer solution is filtered and dried to obtain a silicon-rich phase powder. Mix the silicon-rich phase powder and water at 8:1 and stir evenly, adjust the pH value to 13 with 15% ammonium citrate ammonia solution, continue stirring for 10 minutes, and put it into an ultrasonic wave for 40 minutes.
[0051] The dispersed ...
Embodiment 3
[0053] Add water to monocrystalline silicon and polycrystalline silicon wire cutting waste slurry, the liquid-solid ratio is 5:1, stir to remove polyethylene glycol, after stirring for 3 hours (this process can be carried out at room temperature), filter (this process It can be repeated 3 times to completely remove the polyethylene glycol), and the filter cake is dried. The dried filter cake was put into a ball mill and ground for 20 minutes to obtain a mixed powder of silicon and silicon carbide.
[0054] Mix silicon, silicon carbide powder and water at a ratio of 5:1, stir for 30 minutes and then let stand for 5 hours, the solution is layered, and the upper layer solution is filtered and dried to obtain a silicon-rich phase powder. Mix the silicon-rich phase powder and water at a ratio of 9:1 and stir evenly. Adjust the pH value to 13.5 with a 13% ammonia solution of ammonium malate. After stirring for 10 minutes, put it into an ultrasonic wave for 50 minutes.
[0055] The ...
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