Bismuth nanohole array thin film and preparation method thereof
A technology of hole array and bismuth nanometer, which is applied in the field of bismuth nanohole array film and its preparation, can solve the problems of failing to reach the Fermi wavelength of the material - 40nm range, the preparation method cannot obtain products, and cannot produce quantum size effects. Achieve the effects of low cost, reasonable membrane structure and simple preparation method
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Embodiment 1
[0036] The specific steps of preparation are:
[0037] Step 1. Place the aluminum sheet in a 0.4mol / L oxalic acid solution at 3°C, and after anodizing at 30V DC voltage for 14 hours, place it in a phosphochromic acid solution at 58°C for 28 hours to obtain an aluminum oxide sheet . After the aluminum oxide sheet was placed again under the same conditions for anodization for 10 hours, the unoxidized aluminum on the back of the aluminum oxide sheet was removed with a tin chloride solution to obtain an aluminum oxide template. Among them, after each anodic oxidation, the alumina flakes were soaked in deionized water for 24 hours, and then rinsed and dried.
[0038] Step 2: Put the alumina template in deionized water for 12 hours, and then dry it. After that, the dried alumina template was first placed in a 6wt% phosphoric acid solution at 28°C to remove the barrier layer, and then placed again under the same conditions to expand the hole for 58 minutes to obtain an approximate figur...
Embodiment 2
[0041] The specific steps of preparation are:
[0042] Step 1. Place the aluminum sheet in a 0.35mol / L oxalic acid solution at 4°C. After anodizing for 13h at a DC voltage of 38V, place it in a phosphochromic acid solution at 59°C for 27h to obtain an alumina sheet . After the aluminum oxide sheet was again anodized under the same conditions for 11 hours, the unoxidized aluminum on the back of the aluminum oxide sheet was removed with a tin chloride solution to obtain an aluminum oxide template. Among them, after each anodic oxidation, the alumina flakes were soaked in deionized water for 24 hours, and then rinsed and dried.
[0043] Step 2: Put the alumina template in deionized water for 12 hours, and then dry it. After that, the dried alumina template was first placed in a 5.5wt% phosphoric acid solution at 29°C to remove the barrier layer, and then placed again under the same conditions to expand the hole for 59 minutes to obtain an approximate figure 1 The through-hole alumin...
Embodiment 3
[0046] The specific steps of preparation are:
[0047] Step 1. Place the aluminum sheet in a 0.3mol / L oxalic acid solution at 5°C, and after anodizing at a direct current of 45V for 12 hours, place it in a phosphochromic acid solution at 60°C for 26 hours to obtain an aluminum oxide sheet . After the aluminum oxide sheet was again anodized under the same conditions for 12 hours, the unoxidized aluminum on the back of the aluminum oxide sheet was removed with a tin chloride solution to obtain an aluminum oxide template. Among them, after each anodic oxidation, the alumina flakes were soaked in deionized water for 24 hours, and then rinsed and dried.
[0048] Step 2: Put the alumina template in deionized water for 12 hours, and then dry it. After that, the dried alumina template was placed in a 5 wt% phosphoric acid solution at 30°C to remove the barrier layer, and then placed again under the same conditions to expand the hole for 60 minutes to obtain figure 1 The through-hole alum...
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