A negative thermal expansion material sc 2 mo 3 o 12 Film Preparation Method

A negative thermal expansion material, sc2mo3o12 technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of phase change negative thermal expansion response temperature range, high heat treatment temperature, difficult practical application, etc., to achieve negative thermal expansion The thermal expansion response temperature range is wide, the heat treatment temperature is low, and the effect of stable and good negative thermal expansion performance

Active Publication Date: 2017-11-17
YANGZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In recent years, the research on negative thermal expansion thin film materials has just started, and the research reports on related negative thermal expansion thin film materials mainly focus on AM 2 o 8 ZrW series of negative thermal expansion materials 2 o 8 Thin films, study finds AM 2 o 8 The series of negative thermal expansion films all have many defects such as high heat treatment temperature, need for quenching, phase transition and narrow negative thermal expansion response temperature range, making it difficult to put into practical applications

Method used

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  • A negative thermal expansion material sc <sub>2</sub> mo <sub>3</sub> o <sub>12</sub> Film Preparation Method
  • A negative thermal expansion material sc <sub>2</sub> mo <sub>3</sub> o <sub>12</sub> Film Preparation Method
  • A negative thermal expansion material sc <sub>2</sub> mo <sub>3</sub> o <sub>12</sub> Film Preparation Method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] 1. Target preparation:

[0023] to Sc 2 o 3 and MoO 3 As the raw material, weigh the mixed materials according to the molar ratio of 1:3, place them in alcohol for ball milling for 12 Å, mix the raw materials by ball milling, dry them in an oven at 60°C, grind them with an agate mortar for 0.5h, and then add the precursor The total mass of 3% polyvinyl alcohol is ground to make it evenly mixed, then cold-pressed at 50MPa, degummed at 500°C for 0.5h, sintered at 750°C for 6h, and cooled in the furnace to obtain Sc 2 Mo 3 o 12 ceramic target;

[0024] 2. The quartz substrate is cleaned and activated by conventional processes;

[0025] Put the quartz substrate in H 2 SO 4 :H 2 o 2 :H 2 Ultrasonic cleaning in the solution of O=1:1:2 for 5 minutes, pour off the acid solution, clean with deionized water, and ultrasonically clean with acetone for 5 minutes, and then immerse the cleaned quartz substrate in absolute ethanol solution for use , before sending the subst...

Embodiment 2

[0031] 1. Target preparation:

[0032] to Sc 2 o 3 and MoO 3 As the raw material, the mixed materials were weighed according to the molar ratio of 1:3, put into the ball mill in alcohol for 18 hours, and the raw materials were mixed by ball milling, dried in an oven at 80°C, ground for 0.7 hours with an agate mortar, and then added the precursor The total mass of 4% polyvinyl alcohol is ground to make it evenly mixed, then cold-pressed at 100MPa, debinding at 500°C for 0.7h, sintered at 900°C for 12h, and cooled in the furnace to obtain Sc 2 Mo 3 o 12 ceramic target;

[0033] 2. The quartz substrate is cleaned and activated by conventional processes;

[0034] Put the quartz substrate in H 2 SO 4 :H 2 o 2 :H 2 Ultrasonic cleaning in the solution of O=1:1:2 for 5 minutes, pour off the acid solution, clean with deionized water, and ultrasonically clean with acetone for 5 minutes, and then immerse the cleaned quartz substrate in absolute ethanol solution for use , befo...

Embodiment 3

[0040] 1. Target preparation:

[0041] to Sc 2 o 3 and MoO 3 As the raw material, the mixed materials were weighed according to the molar ratio of 1:3, put in alcohol for ball milling for 24 hours, and after ball milling, the raw materials were dried in an oven at 100°C, ground for 1 hour with an agate mortar, and then added to account for the total amount of the precursor 5% polyvinyl alcohol by mass, grind to mix evenly, then cold press molding at 150MPa, debinding at 500°C for 1h, sintering at 1150°C for 24h, and get Sc after cooling in the furnace 2 Mo 3 o 12 ceramic target;

[0042] 2. The quartz substrate is cleaned and activated by conventional processes;

[0043] Put the quartz substrate in H 2 SO 4 :H 2 o 2 :H 2 Ultrasonic cleaning in the solution of O=1:1:2 for 5 minutes, pour off the acid solution, clean with deionized water, and ultrasonically clean with acetone for 5 minutes, and then immerse the cleaned quartz substrate in absolute ethanol solution for...

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Abstract

The invention discloses a negative thermal expansion material Sc 2 Mo 3 o 12 The method of film preparation. It belongs to the technical field of preparation of inorganic functional thin film materials, and the specific method is to prepare negative thermal expansion Sc by pulse laser method. 2 Mo 3 o 12 film. The advantage of the present invention is to utilize the pulsed laser deposition method to prepare Sc 2 Mo 3 o 12 film, the Sc 2 Mo 3 o 12 The negative thermal expansion of the film has a wide response temperature range, stable performance, low preparation temperature, no need for quenching, and simple heat treatment process. Sc deposited by pulsed laser deposition 2 Mo 3 o 12 The chemical composition of the film and the target maintains a good consistency, and at the same time, the escaped particles have greater energy, which is conducive to the growth of the film, the quality of the prepared film is high, and the preparation process has good repeatability.

Description

technical field [0001] The invention belongs to the technical field of preparation of inorganic functional film materials, in particular to a negative thermal expansion material Sc 2 Mo 3 o 12 The method of film preparation. Background technique [0002] Materials that "shrink with heat and expand with cold" in volume as the temperature changes are negative thermal expansion materials. A 2 m 3 o 12 (A=Sc, Yb, In, Y, etc.; M=W, Mo) series of negative thermal expansion materials have been developed rapidly in recent years because of their excellent performance. sc 2 Mo 3 o 12 It is an excellent negative thermal expansion compound in this series, and its negative thermal expansion coefficient is -3.79×10 in the temperature range of -178K to 1053K -6 K -1 . This excellent property enables the negative thermal expansion material to be used alone or to prepare composite materials, thereby precisely controlling the expansion coefficient of the material. It has broad app...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/28C23C14/08
Inventor 张志萍刘红飞杨露潘坤旻曾祥华陈小兵
Owner YANGZHOU UNIV
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