Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive resin composition, color filter and manufacturing method thereof, and liquid crystal display device

A color filter and photosensitive resin technology, applied in the direction of optical filters, optics, optical components, etc., can solve problems such as poor development resistance, and achieve the effect of improving poor development resistance

Inactive Publication Date: 2016-01-27
CHI MEI CORP
View PDF23 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In view of this, the present invention provides a photosensitive resin composition for color filters, which can improve the above-mentioned poor development resistance on the premise of reducing the surface roughness of the formed hardened product (such as a pixel layer). question

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition, color filter and manufacturing method thereof, and liquid crystal display device
  • Photosensitive resin composition, color filter and manufacturing method thereof, and liquid crystal display device
  • Photosensitive resin composition, color filter and manufacturing method thereof, and liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0234]

[0235] The method that can be used to prepare the photosensitive resin composition is for example: dye (A), pigment (B), alkali-soluble resin (C), compound (D) containing ethylenically unsaturated group, photoinitiator (E) and organic The solvent (F) is placed in a stirrer and stirred to make it uniformly mixed into a solution state, and the additive (G) can also be added if necessary, and after being uniformly mixed, a photosensitive resin composition in a solution state can be obtained.

[0236] Moreover, the preparation method of a photosensitive resin composition is not specifically limited. The preparation method of the photosensitive resin composition is, for example, first dispersing a part of the alkali-soluble resin (C) and the compound (D) containing an ethylenically unsaturated group in a part of the organic solvent (F) to form a dispersion solution; and then It is prepared by mixing the remaining dye (A), pigment (B), alkali-soluble resin (C), ethylenica...

Synthetic example

[0250] Synthesis Example A-1 to Synthesis Example A-8 of the dye (A) are described below:

Synthetic example A-1

[0252] Add 170 parts by mass of anhydrous chloroform, 1.0 parts by mass of camphorsulfonic acid, 1.4 parts by mass of 4-(N,N-dimethylamino)pyridine and 18 parts by mass of basic violet 10 (basicviolet10). parts by mass of 2-hydroxyethyl methacrylate, and stirred for about 30 minutes. Thereafter, slowly adding 47 parts by mass of anhydrous chloroform to 10.5 parts by mass of 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide hydrochloride and dissolving in advance After the solution was stirred at room temperature for about 2 hours. The organic layer was washed twice with 150 parts by mass of 10% saline solution after performing liquid separation operation twice with 150 parts by mass of 1N aqueous hydrochloric acid solution. Then, after adding 43 parts by mass of anhydrous magnesium sulfate and stirring for about 30 minutes, filter the desiccant and distill off the solvent to obtain 20.6 parts by mass of the compound (90% recovery) represented by formula (A1) (hereinafter referre...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
acid valueaaaaaaaaaa
acid valueaaaaaaaaaa
acid valueaaaaaaaaaa
Login to View More

Abstract

The invention provides a photosensitive resin composition, a color filter and manufacturing method thereof, and a liquid crystal display device, wherein the photosensitive resin composition for the color filter is low in surface roughness and good in developing resistance. The photosensitive resin composition for the color filter contains a dye (A), a pigment (B), an alkali soluble resin (C), an ethylene-containing unsaturated-based compound (D), a photoinitiator (E) and an organic solvent (F). The dye (A) comprises a compound represented by the formula (1). The pigment (B) comprises a first pigment (B-1) represented by the formula (2).

Description

technical field [0001] The invention relates to a photosensitive resin composition for a color filter, a color filter, a manufacturing method thereof, and a liquid crystal display device. In particular, it relates to a photosensitive resin composition for a color filter capable of forming a pixel layer with low surface roughness and good development resistance, a color filter, a manufacturing method thereof, and a liquid crystal display device. Background technique [0002] At present, color filters have been widely used in application fields such as color liquid crystal displays, color facsimile machines, and color cameras. Moreover, as the market demand for imaging equipment such as color liquid crystal displays is expanding day by day, the production technology of color filters is also tending to be diversified in order to meet the above-mentioned market demand. [0003] Color filters can usually be obtained by forming pixels of red, green, blue and other colors on a tra...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G02B5/20G02B1/04G02F1/1335
Inventor 谢柏源许荣宾
Owner CHI MEI CORP