Crystalline silicon solar cell capable of realizing double-side light entrance and preparation method therefor
A crystalline silicon solar cell, double-sided light input technology, applied in the field of solar cells, can solve the problems of large-scale production stability, yield to be considered, technology not widely popularized, and high production line price, to increase stability and yield. possibility, production feasibility, well-structured effect
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Embodiment 1
[0027] Taking the n-type single crystal silicon wafer as the base, the present invention will be further described by describing specific implementation cases in combination with the content of the present invention.
[0028] figure 1 The preparation technology route of the entire device structure shown in , and the material composition of each part are described as follows:
[0029] Step 1: Texturing and cleaning of the crystalline silicon wafer 5 . The double-sided texturing of the silicon wafer is carried out with heated NaOH solution, and the silicon wafer is cleaned with HCl solution after texturing, and then washed with a large amount of deionized water and then dried.
[0030] Step 2: Phosphorous doped crystalline silicon film back electric field layer 6 is prepared by phosphorus oxychloride diffusion method. Silicon wafers are diffused back to back in a high-temperature diffusion furnace; after the diffusion is completed, use nitric acid + hydrofluoric acid solution ...
Embodiment 2
[0039] Taking the n-type single crystal silicon wafer as the base, the present invention will be further described by describing specific implementation cases in combination with the content of the present invention.
[0040] figure 1 The preparation technology route of the entire device structure shown in , and the material composition of each part are described as follows:
[0041] Step 1: Texturing and cleaning of the crystalline silicon wafer 5 . The heated NaOH+surfactant solution is used to make double-sided texture on the silicon wafer. After the texture is made, the silicon wafer is cleaned with HCl solution, and then washed with a large amount of deionized water and then dried.
[0042]Step 2: Phosphorous doped crystalline silicon film back electric field layer 6 is prepared by phosphorus oxychloride diffusion method. Silicon wafers are diffused back to back in a high-temperature diffusion furnace; after the diffusion is completed, use nitric acid + hydrofluoric aci...
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