N-type double-side battery and manufacturing method thereof
A double-sided battery and a manufacturing method technology, applied in the field of solar cells
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[0060] Put the N-type silicon chip 110 into the texturizing additive for reaction, control the reaction temperature to 80°C, and the reaction time to 20 minutes, so that the first surface and the second surface of the N-type silicon chip 110 both have a pyramid-shaped textured structure, making The velvet additive is: the mass ratio of alkali, isopropanol, additive and water is 2.5:10:0.5:87;
[0061] Spin-coat 0.5 g of boron-containing silicon oxide solution on the first surface of the N-type silicon wafer 110, and dry it. After drying, the entire surface of the first surface is scanned by laser. The laser scanning condition is: 532nm green light pulse Laser, 18W power, 1.2m / s scanning speed and 50 micron spot diameter, form a p+ doped layer on the first surface, the sheet resistance of the p+ doped layer is 50Ω / □, and the thickness of the p+ doped layer is 0.4 micron, Next, the specific area on the first surface is repeatedly scanned by laser. The conditions for repeated las...
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