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Method of producing a colored crystalline silicon cell

A technology of crystalline silicon cells and manufacturing methods, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve the problems of low conversion efficiency, inability to achieve ohmic contact, poor welding performance, etc., to achieve reliability satisfaction, improve Photoelectric conversion efficiency, the effect of improving solderability

Inactive Publication Date: 2016-03-16
SHANGHAI SHENZHOU NEW ENERGY DEV
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, due to the increase in the thickness of the anti-reflection film of the color battery, the front-side silver paste cannot reach the PN junction to form a good ohmic contact with the current conventional technology and the sintering penetration ability of the conventional front-side silver paste battery, thereby greatly reducing Improve the conversion efficiency of colored cells and the solderability of components
Too low conversion efficiency and poor welding performance make colored batteries unable to meet customer and market requirements, and thus cannot enter the market, which severely limits the application of colored battery components

Method used

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  • Method of producing a colored crystalline silicon cell
  • Method of producing a colored crystalline silicon cell
  • Method of producing a colored crystalline silicon cell

Examples

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Effect test

Embodiment 1

[0018] The manufacturing method of the colored crystalline silicon battery is to process the P-type polycrystalline silicon wafer (25pcs) after texturing, diffusion and etching according to the following process:

[0019] 1. PECVDSiH 4 : NH 3 The flow ratio is 1:3, and the surface of the silicon wafer is coated with a purple-red anti-reflection film with a thickness of 239nm;

[0020] 2. Use the commercially available grade MERCK12# to carry out chemical etching treatment, and the anti-reflection film in the printing area is etched to 60nm;

[0021] 3. Clean the colored silicon wafer with chemical corrosion in ultrasonic to remove the chemical corrosion and dry the silicon wafer;

[0022] 4. Regularly print the front and back electrodes and the back electric field, and use a screen with 85 sub-grid lines to print the front electrodes. After sintering, a group of purple colored cells is obtained.

[0023] Under the condition of AM1.5, 25°C, the electrical performance data of...

Embodiment 2

[0028] The manufacturing method of the colored crystalline silicon battery is to process the P-type polycrystalline silicon wafer (25pcs) after texturing, diffusion and etching according to the following process:

[0029] 1. PECVDSiH 4 : NH 3 The flow ratio is 1:4, and the surface of the silicon wafer is coated with a green anti-reflection film with a thickness of 273nm;

[0030] 2. Use the commercially available grade MERCK12# to carry out chemical etching treatment, and the anti-reflection film in the printing area is etched to 70nm;

[0031] 3. Clean the colored silicon wafer with chemical corrosion in ultrasonic to remove the chemical corrosion and dry the silicon wafer;

[0032] 4. Regularly print the front and back electrodes and the back electric field, and use a screen with 85 sub-grid lines to print the front electrodes. After sintering, a group of green colored cells is obtained.

[0033] Under the condition of AM1.5, 25°C, the electrical performance data of the t...

Embodiment 3

[0038] A method for manufacturing a colored crystalline silicon battery, using the following steps:

[0039] (1) Place the silicon wafer that has been processed by texturing, diffusion, and etching in the PECVD coating equipment, and adjust the SiH 4 : NH 3 The flow ratio of the flow rate is 1:2, and a color anti-reflection film with a thickness of 150nm is deposited on the silicon wafer at one time;

[0040] (2) The silicon wafer coated with the color anti-reflection film is chemically etched to accurately remove the color anti-reflection film in a specific area to a thickness of 100nm. The etchant covers a specific area of ​​the silicon wafer and etches the silicon nitride in the area, accurately removes the color anti-reflection film in the specific area to a thickness of 100nm, and the screen line width of the printed chemical etchant is greater than that of the printed battery The grid line width of the front electrode is 5um, so as to ensure the accuracy of the etched ...

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Abstract

The invention discloses a method for preparing a colored crystalline silicon cell, and relates to the field of the manufacture of a crystalline silicone solar cell. The method comprises a first step of preparing a solar cell colored anti-reflection film (a non-blue anti-reflection film with the thickness greater than or equal to 110nm) for one or more times; a second step of accurately removing the colored anti-reflection film of a specific region by chemical etching; and a third step of preparing positive and negative electrodes of a cell and a back surface field through screen printing and preparing a colored crystalline silicon cell. The method is suitable for both colored monocrystal and polycrystal silicon cells. The method can be used for effectively solving the problems of poor ohmic contact of a colored crystalline silicon cell and poor electrode welding tension. The method provided by the invention can greatly improve the color consistency of the colored crystalline silicon cell. The method is simple in process, high in operability and suitable for mass production, meets the requirements of market users in terms of cell appearance and reliability, and has broad application and market development potential.

Description

technical field [0001] The invention belongs to the field of manufacturing crystalline silicon solar cells, in particular to a method for manufacturing colored crystalline silicon solar cells. Background technique [0002] With the promotion of green energy, solar cells, as an important part of green energy, have received more and more attention. At the same time, with the development requirements of photovoltaic environment integration and photovoltaic building integration, that is, to achieve the goal of integrating the color of solar cell components with buildings or surrounding scenery, more and more customers have more requirements for the color of crystalline silicon cell components. requirements, but the current market is mainly blue-black components, so a single blue-black component can no longer meet customer requirements. [0003] The color of the solar cell module mainly depends on the color of the anti-reflection film of the solar cell. The blue-black module cur...

Claims

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Application Information

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IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 赵钰雪赵晨郑飞张忠卫阮忠立石磊
Owner SHANGHAI SHENZHOU NEW ENERGY DEV
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