Organic electroluminescence device capable of simulating sunlight and preparation method thereof
A technology of luminescence and sunlight, which is applied in the field of organic electroluminescent devices simulating sunlight and its preparation, can solve the problems of increased preparation process requirements, repeatability effects, and complicated device structures, and achieve low preparation process requirements, The effect of simple process and simple structure
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[0098] Example 1
[0099] An organic electroluminescent device A that simulates sunlight. The structure of the device A is: ITO / HAT-CN(100nm) / NPB(15nm) / TAPC(5nm) / Ir(piq) 3 (0.5nm) / TAPC(1.5nm) / Ir(dmppy) 2 (dpp)(0.9nm) / TAPC(3.5nm) / DSA-ph(0.5nm) / TmPyPB(35nm) / LiF(1nm) / Al(200nm).
[0100] Such as Figure 4 As shown, the structure of the device A is sequentially superimposed by the following functional layers:
[0101] Substrate, anode, hole injection layer, hole transport layer, red phosphorescent layer, phosphorescent spacer layer, yellow phosphorescent layer, spacer layer, blue phosphor layer, electron transport layer, electron injection layer, cathode.
[0102] The above-mentioned substrate is glass.
[0103] The above anode is an ITO film.
[0104] The above hole injection layer is a 100 nm thick HAT-CN thin film.
[0105] The above-mentioned hole transport layer includes a hole transport layer 1 and a hole transport layer 2 stacked in sequence, the hole transport layer 1 is a 15 nm thick ...
Example Embodiment
[0129] Example 2
[0130] An organic electroluminescence device that simulates sunlight, the organic electroluminescence device B, and the structure of the device B is: ITO / HAT-CN(100nm) / NPB(15nm) / TAPC(5nm) / Ir(piq) 3 (0.2nm) / Ir(ppy) 3 (0.5nm) / TAPC(3.5nm) / DSA-ph(0.5nm) / TmPyPB(35nm) / LiF(1nm) / Al(200nm).
[0131] Such as Image 6 As shown, the structure of the device B is sequentially superimposed by the following functional layers:
[0132] Substrate, anode, hole injection layer, hole transport layer, red phosphor layer, green phosphor layer, spacer layer, blue phosphor layer, electron transport layer, electron injection layer, cathode.
[0133] The above-mentioned substrate is glass.
[0134] The above anode is an ITO film.
[0135] The hole injection layer is a 60nm thick HAT-CN thin film.
[0136] The above-mentioned hole transport layer includes a hole transport layer 1 and a hole transport layer 2 stacked in sequence, the hole transport layer 1 is a 15 nm thick NPB film, and the hole tr...
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