A homogeneous double-layer hafnium oxide anti-reflection film and its preparation method
A hafnium oxide, anti-reflection coating technology, applied in coating, metal material coating process, ion implantation plating and other directions, can solve the problems of low preparation efficiency, cumbersome process, etc., achieve high-efficiency preparation, broad application prospects, good The effect of anti-reflection and anti-reflection ability
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[0025] In the preparation method provided by the invention, optical software is first used to simulate the thickness and refractive index of the double-layer hafnium oxide anti-reflection film, and to find the optimal anti-reflection parameters. Subsequently, according to simulation calculations, a dense hafnium oxide layer with a high refractive index and a porous hafnium oxide layer with a low refractive index were sequentially deposited on the substrate. The difference in material adjusts the thickness of the bilayer hafnium oxide.
[0026] It specifically includes the following steps:
[0027] 1) At room temperature, fix the substrate on the sample stage of the electron beam evaporation coating machine; use hafnium oxide as the target material, and pump the chamber of the electron beam evaporation coating machine to a vacuum degree of 3×10 －4 ~5×10 －4 Pa;
[0028] 2) Adjust the incident angle of the electron beam to 0° to deposit a dense hafnium oxide layer; then adjust...
Embodiment 1
[0031] 1).Using optical software to simulate the reflectivity of the double-layer hafnium oxide anti-reflection coating on the BK7 glass substrate, to find the optimal anti-reflection parameters, so that the reflectance of the vertically incident light at the reference wavelength of 550nm is reduced to 0; among them, the reflectivity of the BK7 glass The reflectivity is 4.267%, and the refractive index at the reference wavelength of 550nm is 1.52;
[0032] 2). According to the simulation results, a double-layer hafnium oxide anti-reflection coating was deposited on BK7 glass by electron beam evaporation;
[0033] 3). Fix the clean BK7 glass substrate on the sample stage of the electron beam evaporation coating machine;
[0034] 4). At room temperature, using hafnium oxide as the target, pump the chamber of the electron beam evaporation coating machine to a vacuum of 3×10 －4 Pa;
[0035] 5). Adjust the incident angle of the electron beam to 0°, the substrate rotation rate to ...
Embodiment 2
[0050] 1).Using optical software to simulate the reflectivity of the double-layer hafnium oxide anti-reflection coating on the quartz substrate, looking for the optimal anti-reflection parameters, so that the reflectivity of the vertically incident light at the reference wavelength of 550nm is reduced to 0; the reflectivity of the quartz It is 3.45%, and the refractive index at the reference wavelength of 550nm is 1.45;
[0051] 2). According to the simulation results, a double-layer hafnium oxide anti-reflection coating was deposited on the quartz wafer by electron beam evaporation;
[0052] 3). Fix the clean quartz substrate on the sample stage of the electron beam evaporation coating machine;
[0053] 4). At room temperature, use hafnium oxide as the target material, and pump the chamber of the electron beam evaporation coating machine to a vacuum degree of 4×10 －4 Pa;
[0054] 5). Adjust the incident angle of the electron beam to 0°, the substrate rotation rate to 2rpm, ...
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