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Fabric structure color preparation method

A fabric structure and fabric technology, applied in animal fibers, textiles and papermaking, nanotechnology for materials and surface science, etc., can solve problems such as high free formaldehyde content, endangering human health, poor biodegradability, etc., and achieve adaptability wide, bright colors, simple process effect

Active Publication Date: 2016-05-25
GUANGDONG XINFENG TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the traditional dyeing and finishing process, a large number of dyes and auxiliaries that affect the environment and hinder the health of the body are used. Their biodegradability is poor, the content of free formaldehyde is high, and the content of heavy metal ions exceeds the standard. These dyes and auxiliaries are gas, liquid, and solid. The form of emission will pollute the environment and endanger human health. At the same time, the dyeing and finishing process will consume a lot of energy and water

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Fabric structure color preparation method
  • Fabric structure color preparation method
  • Fabric structure color preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Use 30-denier 630T polyester white gray cloth as the base fabric, and pretreat it: configure 1g / L polyester softener solution at a liquor ratio of 1:50 to soak the fabric for 30 minutes of ultrasonic treatment → soak the fabric for 30 minutes of ultrasonic treatment in pure water → Rinse the fabric with pure water 3 times → dry (60°C). Put the treated fabric into a vacuum chamber, and use radio frequency magnetron sputtering technology under specific vacuum conditions to deposit nano-TiO 2 , SiO 2 Deposits on fabric surface. Specific process: target TiO 2 The purity of SiO is 99.99%. 2 The purity of argon is 99.99%, and the purity of argon is 99.95%. Using radio frequency sputtering, the sputtering process parameters are: target base distance 40mm, background vacuum 2*10 -3 Pa, the working pressure is 5Pa, the argon gas flow rate is 15sccm, the sputtering power is 84W, first sputter TiO for 2 hours 2 , and then sputtered for 4 hours on SiO 2 , this is one cycle, ...

Embodiment 3

[0030] Use 30-denier 630T polyester white gray cloth as the base fabric, and pretreat it: configure 1g / L polyester softener solution at a liquor ratio of 1:50 to soak the fabric for 30 minutes of ultrasonic treatment → soak the fabric for 30 minutes of ultrasonic treatment in pure water → Rinse the fabric with pure water 3 times → dry (60°C). Put the treated fabric into a vacuum chamber, and use radio frequency magnetron sputtering technology under specific vacuum conditions to deposit nano-TiO 2 , SiO 2 Deposits on fabric surface. Specific process: target TiO 2 The purity of SiO is 99.99%. 2 The purity of argon is 99.99%, and the purity of argon is 99.95%. Using radio frequency sputtering, the sputtering process parameters are: target base distance 40mm, background vacuum 2*10 -3 Pa, the working pressure is 5Pa, the argon gas flow rate is 15sccm, the sputtering power is 84W, first sputter TiO for 2 hours 2 , and then sputtered for 4 hours on SiO 2 , this is one cycle, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The present invention relates to a fabric structure color preparation method. According to the present invention, a magnetron sputtering radio frequency method is used, TiO2, SiO2 and the like are adopted as targets, sputtering is performed on a base cloth, the TiO2 and SiO2 (or other materials) targets are subjected to alternate sputtering on the surface of a fabric to form a nanometer period film on the fabric surface, the fabric presents a bright structure color due to light interference and other optical principles, the fabric surface color is determined by the sputtering material, the number of the sputtering layers and the thickness of each sputtering layer, the fabric color is changed along with the change of the observation angle, and the fabric does not fade if the film structure is not damaged; and the structure color fabric researched and developed through the preparation method has characteristics of uniform film, controllable film thickness and no requirement of any dye auxiliary agents, the method is the environmentally friendly dyeing method, and the defects of high pollution and high energy consumption in the traditional dyeing and finishing industry are expected to be solved.

Description

technical field [0001] The invention belongs to the field of innovative textiles and relates to a method for preparing fabric structural colors. Background technique [0002] The invention relates to a method for preparing a structural color period film on a fabric by utilizing optical principles such as light interference and scattering. [0003] In nature, there are two main sources of color formation, pigment color and structural color. Pigment color is due to the fact that animals contain a certain chemical substance - pigment, which can selectively absorb light of a specific wavelength and reflect light of other wavelengths, so it is also called chemical color. Structural color is the color produced by the interaction of light and its wavelength magnitude, that is, the color produced by the interference, scattering or diffraction of light, so it is also called physical color. Structural color has many advantages that pigments do not have: high brightness, high saturat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D06M11/46D06M11/79C23C14/35B82Y40/00B82Y30/00D06M101/32D06M101/10
Inventor 杜文琴叶丽华
Owner GUANGDONG XINFENG TECH
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