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Preparation method of rotary sputtering aluminum rare-earth alloy target for touch screen of flat panel display and target prepared by using preparation method

A flat-panel display and sputtering target technology, applied in sputtering plating, metal material coating process, ion implantation plating, etc., can solve problems such as insufficient technical capabilities, uneven film thickness, and reduced transmittance. Achieve the effect of reducing production cost, reducing follow-up procedures, and simple process

Active Publication Date: 2016-06-01
赣州优膜科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, domestic manufacturers have carried out the research and development and production of Nd-Al targets, but they mainly focus on the production of low-end small-size planar Nd-Al sputtering targets by hot pressing or vacuum melting. Tailored and welded, but the coating quality cannot meet the requirements due to many seams, such as: increased surface resistance, uneven film thickness, reduced transmittance, etc., only partially used on ordinary coated glass, and cannot be applied to flat panel displays On high-end products such as screens and touch screens, the technical capabilities are obviously insufficient

Method used

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  • Preparation method of rotary sputtering aluminum rare-earth alloy target for touch screen of flat panel display and target prepared by using preparation method

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Embodiment 1

[0022] This embodiment is a method for preparing an aluminum neodymium (Al-Nd) rotating rotating target, comprising the following steps:

[0023] (1) Powder preparation: select aluminum powder with a purity of 99.995% and 99.99% and the required neodymium rare earth powder, mechanically mix the aluminum powder and neodymium powder, sinter in vacuum at 300°C for 5 hours, ball mill for 4 hours, pass Sieve to obtain aluminum neodymium powder with a particle size of 325 mesh.

[0024] (2) Cold isostatic pressing: put the mixed aluminum and neodymium powder into the mold and put it into the cold isostatic pressing machine, turn on the cold isostatic pressing, pressurize at 10Mpa per minute, and keep the pressure for 5 minutes after reaching 150Mpa. The pressure is released at 10 MPa per minute, and the relative density of the green target tube after cold isostatic pressing is 68%.

[0025] (3) Vacuum sintering: put the green embryo target tube formed by cold isostatic pressing int...

Embodiment 2

[0030] This embodiment is a method for preparing an aluminum yttrium (Al-Y) rotating rotating target, comprising the following steps:

[0031] (1) Powder preparation: select aluminum powder with a purity of 99.995% and 99.99% and the required yttrium rare earth powder, mechanically mix the aluminum powder and yttrium powder, sinter in vacuum at 450° C. for 10 hours, ball mill for 8 hours, pass Sieve to obtain aluminum yttrium powder with a particle size of 400 mesh.

[0032] (2) Cold isostatic pressing: put the mixed aluminum yttrium powder into the mold and put it into the cold isostatic pressing machine, turn on the cold isostatic pressing, pressurize at 10Mpa per minute, and hold the pressure for 10 minutes after waiting for 250Mpa. The pressure is released at 10 MPa per minute, and the relative density of the green target tube after cold isostatic pressing is 77%.

[0033] (3) Vacuum sintering: put the green embryo target tube formed by cold isostatic pressing into a vacu...

Embodiment 3

[0038] This embodiment is a method for preparing an aluminum dysprosium (Al-Dy) rotating target, comprising the following steps:

[0039] (1) Powder preparation: select aluminum powder with a purity of 99.995% and 99.99% and the required dysprosium rare earth powder, mechanically mix the aluminum powder and dysprosium powder, sinter in vacuum at 600°C for 6 hours, ball mill for 6 hours, pass Sieve to obtain aluminum dysprosium powder with a particle size of 325 mesh.

[0040] (2) Cold isostatic pressing: put the mixed aluminum dysprosium powder into a mold and put it into a cold isostatic press, turn on the cold isostatic pressing, pressurize at 10Mpa per minute, keep the pressure for 15 minutes after reaching 200Mpa, and release The pressing is carried out at 10Mpa per minute, and the relative density of the green target tube after cold isostatic pressing is 73%.

[0041] (3) Vacuum sintering: put the green embryo target tube formed by cold isostatic pressing into a vacuum s...

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Abstract

The invention discloses a preparation method of a rotary sputtering aluminum rare-earth alloy target for a touch screen of a flat panel display and a target prepared by using the preparation method. The preparation method comprises the following steps of powder preparation, cold isostatic pressing, vacuum sintering, hot isostatic pressing, machining and indium binding. The method is simple in process and convenient to operate; the conventional canning and argon arc welding are not needed during hot isostatic pressing, so that the subsequent process is reduced; and a large target tube can be directly subjected to hot isostatic pressing, so that the production cost is reduced. The rotary sputtering aluminum rare-earth alloy target prepared by using the preparation method disclosed by the invention is uniform in component and can be 4000mm long or longer, the target tube can be 25mm thick, the target has the relative density of larger than or equal to 99.9%, the purity of larger than or equal to 99.99% and the grain size of smaller than 30mu m, and the prepared rotary target belongs to a high-grade rotary target and can be applied to wider fields.

Description

technical field [0001] The invention relates to a target material and target material preparation technology, in particular to a method for preparing an aluminum rare earth alloy rotary sputtering target material for a flat panel display touch screen and the target material. Background technique [0002] Al-rare-earth alloy targets are widely used in the fields of flat-panel display and large-scale integrated circuits, which require that the aluminum-rare-earth alloy targets have the advantages of high purity, high density, and large size. At present, the methods of vacuum smelting and vacuum hot pressing sintering are mainly used to prepare small-sized aluminum-rare-earth alloy targets and are planar. When used for coating, the utilization rate is as low as 20-30%. With the development of coating technology, due to the high utilization rate of the rotating target, reaching 80-90%, at the same time, the process of the target is stable in the sputtering process, and the quali...

Claims

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Application Information

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IPC IPC(8): C23C14/34B22F3/16
CPCB22F3/16C23C14/3407C23C14/3414
Inventor 徐从康
Owner 赣州优膜科技有限公司