Film coating method for titanium dioxide through vapor atomic deposition
A technology of atomic deposition and titanium dioxide, applied in the direction of titanium dioxide, titanium oxide/hydroxide, etc., can solve the problems of difficult control of thickness and uniformity, and achieve the effects of short reaction time, shortened coating process, and environmental protection industry scale-up
Active Publication Date: 2016-06-15
SICHUAN UNIV
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Problems solved by technology
QuintH.Powell et al [Journalofmaterialsresearch,1997,12(02):552-559] used the high temperature vapor deposition method to coat the chlorinated titanium dioxide particles, and reacted at 1300?C and 1500?C by controlling SiCl 4 with N 2 and the ratio of water vapor to control the coating morphology, in TiO 2 Amorphous SiO is formed on the particle surface 2 layer, but the thickness and uniformity are difficult to control
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Embodiment 1
[0024] Example 1: a. Dry the primary product of anatase at 170° C. for 60 minutes to remove moisture adsorbed on the surface.
[0025] b. Weigh a certain mass of heat-treated anatase, spread it flat on a petri dish, and place it in a vacuum desiccator.
[0026] c, will put SiCl 4 After the liquid sample bottle is uncapped, place it in a vacuum desiccator, and evacuate to make the vacuum degree 0.065Mpa.
[0027] d. After standing for 60 minutes, open the lid and place for 20 minutes, take out the culture dish and place it in a 200°C oven for 90 minutes.
[0028] e. Repeat the above operation after grinding to increase the thickness of the coating.
[0029] Take a small amount of titanium dioxide coated once obtained by the above method, and carry out TEM detection, such as figure 1 As shown in (a), it can be seen from the figure that the inventive method can obtain a uniform and dense silicon dioxide film layer on the surface of the titanium dioxide particles. figure 1 (b)...
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The invention discloses a new method for vapor atomic deposition of titanium dioxide. When the titanium dioxide is coated by a film, photocatalytic activity on the surface can be enclosed and weather resistance of the titanium dioxide coating can be effectively improved. In a conventional industrial film coating method, liquid deposition is employed with silicate solutions, such as sodium silicate, so that a formed silicon film is thick and is uneven. The invention provides a gas-phase film coating method, which includes the steps of performing surface hydroxylation treatment to a dry titanium dioxide raw material, vacuum-degassing the raw material, and feeding SiCl4 vapor to perform surface hydrolysis reaction deposition to the surface hydroxyl groups on the titanium dioxide to form single-atom-layer silicon oxide film on the titanium dioxide surface. The SiO2 film layer formed through the coating method is uniform and has atom dispersing property. The vapor atomic deposition film has strong covering performance and excellent optical performance, and can significantly improve the dispersibility and weather resistance of the titanium dioxide. Compared with the conventional liquid film coating method, the method is simple in operation, can form a compact film layer, is short in reaction time and is free of generation of waste liquid, is a novel film coating method which is more environment-friendly and economical and is easy to use industrially. The method also can be used for coating semiconductor oxide particles, carbon nanotubes, metal sheets and other different substrates.
Description
technical field [0001] The invention relates to the field of chemical industry, in particular to a method for gas-phase coating silicon dioxide film layer on pigment titanium dioxide powder. Background technique [0002] Titanium dioxide, especially rutile titanium dioxide, is considered to be the best white pigment in the world because of its non-toxicity, stability and high refractive index. It is widely used in coatings, plastics and paper industries. Nanoscale TiO 2 Particles have high application prospects in the field of ultraviolet absorption and shielding due to their good characteristics of absorbing, reflecting and scattering ultraviolet rays. However, due to TiO 2 It has strong photocatalytic activity, so under light, especially ultraviolet light, the matrix organic matter in coatings and plastics will be degraded, leading to pulverization of coatings and affecting the weather resistance of materials. TiO 2 The unique photocatalytic properties restrict the sco...
Claims
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Inventor 梁斌郭婧袁绍军
Owner SICHUAN UNIV