Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Waste treatment method for gas-phase method quartz product manufacturing process and waste treatment method for optical fiber perform manufacturing process

A technology for product manufacturing and waste treatment, applied in separation methods, multi-stage water treatment, water/sewage treatment, etc., can solve the problems of large number and troubles of fiber optic enterprises, and achieve reduced investment, high generation rate, and zero system discharge. Effect

Active Publication Date: 2016-07-13
HAWK SHANGHAI ENVIRONMENTAL TECH
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0026] Therefore, the waste treatment processes currently used in the optical fiber industry will produce waste that needs to be further processed or discarded, and the amount is large, which has brought great troubles to many optical fiber companies.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Waste treatment method for gas-phase method quartz product manufacturing process and waste treatment method for optical fiber perform manufacturing process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0049] like figure 1 Shown, the waste treatment method of the gas-phase method quartz product manufacturing process, including steps

[0050] Part of the HCl gas produced by the gas phase method quartz deposition step is treated by the dust collector to generate hydrochloric acid after being washed with water, and the remaining HCl gas reacts with NaOH to generate NaCl and H 2 0, the generated NaCl is added in the second reaction vessel.

[0051] Set up the first reaction vessel as figure 1 In the 1# reaction tank shown, the exhaust gas produced in the vapor phase quartz deposition step is treated by the dust collector and the SiO 2 into the first reaction vessel; at least a part of the waste liquid produced by the quartz etching process is added into the first reaction vessel, and the silicon dioxide reacts with the HF in the waste liquid produced by the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a waste treatment method for a gas-phase method quartz product manufacturing process and a waste treatment method for an optical fiber perform manufacturing process.The waste treatment method for the gas-phase method quartz product manufacturing process includes: adding SiO2 micropowder into a first reaction vessel; adding waste liquid generated by quartz etching treatment into the first reaction vessel; allowing reaction of H2SiF6 with NaCl to generate Na2SiF6 and HCl; allowing reaction of NaOH with HF in the waste liquid generated by quartz etching treatment to generate NaF and water, and allowing reaction of NaOH with H2SiF6 in the waste liquid generated by quartz etching treatment to generate Na2SiF6 and water; adding the Na2SiF6 generated in a second reaction vessel and NaF and Na2SiF6 generated in a third reaction vessel into a fourth reaction vessel, adding Na2CO3 into the fourth reaction vessel, and allowing reaction of the Na2SiF6 with the Na2CO3 to generate NaF, SiO2 and CO2.The comprehensive treatment process can completely substitute for an original CaF2 neutralization and sedimentation process, investment of a wastewater treatment system is reduced, fluorine ion residues are avoided, and system zero emission can be realized.

Description

technical field [0001] The invention relates to a waste treatment method in the gas-phase method quartz product manufacturing process and a waste treatment method in the optical fiber preform rod manufacturing process. Background technique [0002] Quartz products are used in a wide range of applications, and come in various shapes such as rods and blocks depending on the application. Especially in the field of optical fiber, optical fiber preform is one of the application forms of quartz products. [0003] There are also many ways to manufacture quartz products. For example, vapor deposition method is one of the common manufacturing processes. Optical fiber preform is the matrix material for optical fiber drawing, and its composition is high-purity silica. At present, vapor deposition is used to manufacture optical fiber preforms or high-purity quartz crystals. In OVD or VAD process, SiCl 4 The raw material undergoes high-temperature hydrolysis under the hydrogen-oxygen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C02F9/04B01D53/78B01D53/68C01B33/10C01D3/02C02F101/14
CPCY02C20/30C02F9/00B01D53/68B01D53/78C01B33/103C01D3/02C02F1/5236C02F2101/14C02F2301/08
Inventor 吴涛苏国雄杨吉耀
Owner HAWK SHANGHAI ENVIRONMENTAL TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com