Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Broadband dielectric parameter acquisition method based on multiple-beam interference effect

A technology of multi-beam interference and dielectric parameters, applied in the field of measurement and inversion of absorption coefficient, complex refractive index, and dielectric parameters, can solve problems such as inability to obtain data, loss of useful information, and increased errors

Active Publication Date: 2016-08-31
TIANJIN UNIV
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, limited by the band range and terahertz transmission power of the terahertz time-domain spectroscopy system, there is a large noise in the high-frequency band, which makes the system inaccurate, so it is impossible to obtain accurate data in the wide-band range
At the same time, when the terahertz time-domain spectroscopy system performs data processing, it needs to properly intercept the multiple reflection signals on the sample surface (multilevel interference spectrum in the time-domain signal). This process will lead to the loss of some useful information, resulting in Increased error

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Broadband dielectric parameter acquisition method based on multiple-beam interference effect
  • Broadband dielectric parameter acquisition method based on multiple-beam interference effect
  • Broadband dielectric parameter acquisition method based on multiple-beam interference effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0084] Embodiment 1: A polished silicon wafer was selected as an experimental sample for actual measurement and calculation. The thickness of the sample is 0.38 mm, and the diameter is 50 mm.

[0085] Far-infrared Fourier spectrometer transmission measurement system, the structure diagram of the whole measurement system is as follows figure 2 shown.

[0086] The high-pressure mercury lamp is used as the radiation light source to emit a continuous broadband spectrum, which can cover the terahertz band and the far-infrared band. During the measurement process, the stable output power of the high-pressure mercury lamp is adjusted to 65W;

[0087] The effective aperture of the applied pinhole diaphragm is 2mm;

[0088] The applied off-axis parabolic mirror has an effective focal length of 250mm and a diameter of 100mm, and the surface is treated with an oxidized gold film;

[0089] Set the number of scanning repetitions of the system to 10 times, the scanning resolution to 0.6c...

Embodiment 2

[0115] Embodiment 2: A polished silicon sample was selected as the experimental sample for actual measurement and calculation. The thickness of the sample is 0.38 mm, and the diameter is 50 mm.

[0116] Reflective measurement system, the interference optical path system of the spectrometer is the same as that of the transmissive type. The placement of the reflective sample cell and the placement of the sample require a known angle. The placement of the sample is as follows: figure 2 shown.

[0117] The measurement environment and external conditions are the same as the transmission measurement.

[0118] Step 1: Measure the interferogram of the vacuum background when there is no sample and record the corresponding data file to obtain the background interferogram;

[0119] Step 2: Measure the interferogram after placing the sample and save the data to obtain the signal interferogram;

[0120] Step 3: Calculate and analyze the acquired background and sample data to obtain corr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to the broadband range material dielectric parameter acquisition field, and provides a new method for acquiring dielectric parameters from microwave, terahertz to infrared band. According to a technical scheme adopted by the invention, the broadband dielectric parameter acquisition method based on multiple-beam interference effect includes data acquisition and data processing processes. The data acquisition comprises acquisition of background data and signal data after putting a sample, a Fourier spectrometer is employed for measurement so as to acquire an interferogram, the abscissa of the interferogram is the position of a spectrometer interference arm moving mirror, and the ordinate is the response voltage of a detector to an interference signal. Data processing comprises primary processing to original data and inversion calculation of optical parameters. The inversion calculation of optical parameters is subdivided into interference order solution, real refractive index calculation, extinction coefficient calculation, absorption coefficient calculation, and dielectric parameter calculation, thus finally obtaining the dielectric parameters. The method provided by the invention is mainly used for broadband range material dielectric parameter acquisitions.

Description

technical field [0001] The invention relates to the field of obtaining dielectric parameters of materials with a wide band range, and specifically relates to a method for measuring and inverting the complex refractive index, absorption coefficient and dielectric parameters of a material. Background technique [0002] The optical parameters of materials, including the refractive index, absorption coefficient, extinction coefficient and dielectric parameters obtained by inversion, can be used to characterize the optical properties of a material. Simulation is an indispensable parameter for simulation. For any material, the determination of their spectral characteristics and optical parameters in various bands such as ultraviolet, visible light, infrared and microwave has always been a matter of great concern. In recent years, with the continuous development of terahertz technology, the calculation and measurement of dielectric parameters of materials in the terahertz band hav...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N21/3581G01N21/3586G01N22/00
CPCG01N21/3581G01N21/3586G01N22/00G01N2021/3595
Inventor 钟凯王茂榕郭拾贝刘楚徐德刚王与烨姚建铨
Owner TIANJIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com