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Novel method for preparing single-layer MoS2

A new method, single-layer technology, applied in the field of materials, can solve the problems of low repeatability and inability to guarantee the preparation of single-layer MoS2, and achieve the effects of improved repeatability, short preparation cycle and low cost

Inactive Publication Date: 2016-10-26
HANGZHOU DIANZI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Single-layer MoS 2 It is a semiconductor material with a direct band gap, but the current preparation methods cannot guarantee the preparation of large-sized single-layer MoS 2 , and the repeatability is not high

Method used

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  • Novel method for preparing single-layer MoS2

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Step (1). SiO 2 (300nm) / Si sheet cut into 1cm 2 Small square blocks serve as substrates.

[0053] Step (2). Ultrasonic cleaning of the substrate obtained in step (1) with deionized water at room temperature for 10 minutes.

[0054] Step (3). Ultrasonic cleaning of the substrate obtained in step (2) with AR, 99.7% absolute ethanol solution at room temperature for 10 minutes.

[0055] Step (4). Ultrasonic cleaning of the substrate obtained in step (3) with deionized water at room temperature for 10 minutes.

[0056] Step (5). Ultrasonic cleaning of the substrate obtained in step (4) with 30% hydrogen peroxide at normal temperature for 10 minutes.

[0057] Step (6). Ultrasonic cleaning of the substrate obtained in step (5) with deionized water at room temperature for 10 minutes.

[0058] Step (7). Blow dry the substrate obtained in step (6), and then set the speed of the homogenizer at a low speed of 2000 rpm and a high speed of 8000 rpm, and control the spin coating t...

Embodiment 2

[0066] Step (1). SiO 2 (300nm) / Si sheet cut into 1cm 2 Small square blocks serve as substrates.

[0067] Step (2). Ultrasonic cleaning of the substrate obtained in step (1) with deionized water at room temperature for 10 minutes.

[0068] Step (3). Ultrasonic cleaning of the substrate obtained in step (2) with AR, 99.7% absolute ethanol solution at room temperature for 10 minutes.

[0069] Step (4). Ultrasonic cleaning of the substrate obtained in step (3) with deionized water at room temperature for 10 minutes.

[0070] Step (5). Ultrasonic cleaning of the substrate obtained in step (4) with 30% hydrogen peroxide at normal temperature for 10 minutes.

[0071] Step (6). Ultrasonic cleaning of the substrate obtained in step (5) with deionized water at room temperature for 10 minutes.

[0072] Step (7). Dry the substrate obtained in step (6), then soak the bottom of the substrate into the graphene oxide quantum dot solution, then take out the substrate by pulling method, and...

Embodiment 4

[0077] Step (1). SiO 2 (300nm) / Si sheet cut into 1cm 2 A small square block serves as a substrate.

[0078] Step (2). Ultrasonic cleaning of the substrate obtained in step (1) with deionized water at room temperature for 10 minutes.

[0079] Step (3). Ultrasonic cleaning of the substrate obtained in step (2) with AR, 99.7% absolute ethanol solution at room temperature for 10 minutes.

[0080] Step (4). Ultrasonic cleaning of the substrate obtained in step (3) with deionized water at room temperature for 10 minutes.

[0081] Step (5). Ultrasonic cleaning of the substrate obtained in step (4) with 30% hydrogen peroxide at normal temperature for 10 minutes.

[0082] Step (6). Ultrasonic cleaning of the substrate obtained in step (5) with deionized water at room temperature for 10 minutes.

[0083] Step (7). Dry the substrate obtained in step (6), then set the speed of the glue homogenizer to 1000 rpm at a low speed and 7000 rpm at a high speed, and control the spin coating ti...

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Abstract

The invention discloses a novel method for preparing single-layer MoS2. Specifically, the size of the single-layer MoS2 and experiment repeatability are improved with a catalytic method. According to the invention, a SiO2 / Si substrate is treated with a carbon-containing catalyst solution, and a single-layer MoS2 sample is prepared with a CVD method. The optical properties and surface topography of the sample are subjected to test analysis with a metallographic microscope, a Raman spectrometer, an atomic force microscope, a scanning electron microscope and the like. According to the invention, the single-layer MoS2 is prepared with the catalytic method, and the size of the single-layer MoS2 is improved to tens of micrometers. The quality of the single-layer MoS2 is good, and the repeatability of the experiment is improved. Compared to prior arts, with the method, large-size single-layer MoS2 is prepared, and experiment repeatability is also improved. The experiment has the advantages of simple operation, high feasibility, short preparation period, low cost, and the like.

Description

technical field [0001] The invention belongs to the field of material technology, in particular to a method for preparing single-layer MoS 2 new method. Background technique [0002] MoS 2 As a graphene-like material, it has some characteristics of graphene. Monolayer MoS 2 The thickness is about 0.65nm and it is a direct bandgap semiconductor material with a bandgap of about 1.8eV. MoS 2 With electrical, optical and catalytic properties, it can be used as a complement to graphene materials, such as: optoelectronics and energy storage. Due to the monolayer MoS 2 It is a semiconductor material with an atomic layer thickness, so it is very sensitive to the external environment. By studying single-layer MoS 2 The physical properties of these materials are of great significance to the development of next-generation electronic devices, optical devices, and biosensors. [0003] Single-layer MoS 2 It is a semiconductor material with a direct band gap, but the current prep...

Claims

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Application Information

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IPC IPC(8): C01G39/06
CPCC01G39/06C01P2002/82C01P2004/03C01P2004/61
Inventor 苏伟涛
Owner HANGZHOU DIANZI UNIV
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