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Environment-friendly photoresist cleaning liquid and preparation method thereof

A technology of photoresist and cleaning solution, which is applied in the field of environment-friendly photoresist cleaning solution and its preparation, can solve the problems of increased processing cost, large environmental impact, cleaning power that does not corrode the substrate, etc., and achieves good cleaning effect, The effect of small environmental hazards and good market application prospects

Inactive Publication Date: 2016-11-09
王泽陆
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photoresist cleaning solutions currently on the market cannot achieve a good balance in terms of cleaning power and non-corrosion of the substrate.
In addition, the photoresist cleaning solution in the prior art generally contains a large amount of acid-base reagents, which has a great impact on the environment and increases subsequent processing costs

Method used

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  • Environment-friendly photoresist cleaning liquid and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] An environmentally friendly photoresist cleaning solution, comprising the following components in parts by weight: 5 parts of 5-butyl hydantoin, 2-6 parts of dimethyl fumarate, and tris(3-methoxyphenyl)phosphine 2 Parts, 4 parts tetradecyl dimethyl betaine, 3 parts polyethylene glycol oleate, 1 part tea saponin, 1 part carbon molecular sieve, 2 parts decyl glucoside, 2 parts isobutyl salicylate , 1 part of D-talitol, 2 parts of 2-(diethanolamino)ethanesulfonic acid, 3 parts of betulinic acid, 0.2 part of ionone, 1 part of diallyl dimethyl ammonium chloride, 1 part of lauroyl di 1 part of ethanolamine, 0.8 part of polyethylene glycol bisester, 2 parts of dehydroabietic acid, 5 parts of α-terpineol, and 18 parts of deionized water.

[0023] The preparation method of the environmental protection photoresist cleaning solution includes the following preparation steps:

[0024] Step 1) Add tea saponin into deionized water, stir to dissolve, and then add diallyl dimethyl ammonium ...

Embodiment 2

[0029] An environmentally friendly photoresist cleaning solution, comprising the following components by weight: 12 parts of 5-butyl hydantoin, 6 parts of dimethyl fumarate, 8 parts of tris(3-methoxyphenyl) phosphine, 10 parts of myristyl dimethyl betaine, 8 parts of polyethylene glycol oleate, 5 parts of tea saponin, 4 parts of carbon molecular sieve, 6 parts of decyl glucoside, 6 parts of isobutyl salicylate, D -4 parts of talitol, 6 parts of 2-(diethanolamino)ethanesulfonic acid, 7 parts of betulinic acid, 1 part of ionone, 3 parts of diallyldimethylammonium chloride, 4 parts of lauroyl diethanolamine Parts, 3 parts of polyethylene glycol diacid ester, 6 parts of dehydroabietic acid, 9 parts of α-terpineol, 25 parts of deionized water.

[0030] The preparation method of the environmental protection photoresist cleaning solution includes the following preparation steps:

[0031] Step 1) Add tea saponin into deionized water, stir to dissolve, then add diallyl dimethyl ammonium ch...

Embodiment 3

[0036] An environmentally friendly photoresist cleaning solution, comprising the following components in parts by weight: 7 parts of 5-butyl hydantoin, 2.5 parts of dimethyl fumarate, 3 parts of tris(3-methoxyphenyl) phosphine, 4.2 parts of tetradecyl dimethyl betaine, 3.5 parts of polyethylene glycol oleate, 1.2 parts of tea saponin, 1.5 parts of carbon molecular sieve, 2.2 parts of decyl glucoside, 3 parts of isobutyl salicylate, D -1.38 parts of talitol, 2.4 parts of 2-(diethanolamino)ethanesulfonic acid, 3.8 parts of betulinic acid, 0.4 parts of ionone, 1.2 parts of diallyldimethylammonium chloride, 1.4 parts of lauroyl diethanolamine Parts, 0.9 parts of polyethylene glycol diacid ester, 2.4 parts of dehydroabietic acid, 5.6 parts of α-terpineol, and 19 parts of deionized water.

[0037] The preparation method of the environmental protection photoresist cleaning solution includes the following preparation steps:

[0038] Step 1) Add tea saponin into deionized water, stir to di...

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Abstract

The invention discloses environment-friendly photoresist cleaning liquid and a preparation method thereof. The environment-friendly photoresist cleaning liquid is prepared from the following components: 5-butylhydantoic acid, dimethyl fumarate, tris(3-methoxyphenyl)phosphine, dodecyl dimethyl betaine, polyoxyl oleate, tea saponin, a carbon molecular sieve, decyl glucoside, isobutyl salicylate, D-talitol, N,N-bis(2-hydroxyethyl)-2-amino ethanesulfonic acid, betulinic acid, ionone, diallyl dimethyl ammonium chloride, lauroyl diethanol amine, polyethylene glycol diacid ester, dehydroabietic acid, alpha-terpilenol and deionized water. The environment-friendly photoresist cleaning liquid disclosed by the invention is good in cleaning effect and free of corrosion, and the two properties, namely, the cleaning performance and the substrate corrosion prevention property, are well balanced. In addition, the environment-friendly photoresist cleaning liquid is free of massive acid-base reagent, small in environmental harm and good in market application prospect, and no extra continuous treatment cost is increased.

Description

Technical field [0001] The invention belongs to the technical field of electronic materials, and specifically relates to an environmentally friendly photoresist cleaning solution and a preparation method thereof. Background technique [0002] The photolithography process is a conventional process used in the fields of manufacturing touch circuits, printed circuits, integrated circuits, display screens, and gene chips, and photoresist is one of the important raw materials in the photolithography process. Photoresist is a mixed liquid that is composed of photosensitive resin, sensitizer, and solvent and is sensitive to light. At present, there are various types of photoresist, which can be roughly divided into positive glue and negative glue according to the development principle. The role of photoresist is mainly to form a mask on the surface of the material, and to transfer the pattern after exposure. In the photolithography process, the remaining photoresist should be removed ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/422
Inventor 王泽陆
Owner 王泽陆
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