Manufacturing method of thin-film thermoelectric semiconductor device by employing ceramic thin film as base material
A thermoelectric semiconductor and ceramic thin film technology, which is applied in the manufacture/processing of thermoelectric devices, thermoelectric device components, etc., can solve problems such as restricting the popularization and application of thermoelectric technology, difficult to further improve the overall performance of thermoelectric devices, and difficult to solve thin film substrates.
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Embodiment 1
[0027]Embodiment 1: the present embodiment selects heavily doped P-type and N-type Si semiconductor materials to make high-temperature thermoelectric semiconductor devices, and the conductive electrode material is selected from Ni-based materials; the main crystal phase material of ceramic film materials is selected from Al2O3; modified additives BaO, TiO₂, MgO, CaO; the sintering flux uses SiO₂, ZnO, B₂O₃, Bi₂O₃ to prepare relevant slurry; the ceramic slurry is based on 65wt% of the main crystal phase and 5wt% of the modified additive (the proportion of which is One is: BaO: 2 wt%, TiO₂: 0.5wt%, MgO: 1.5wt%, CaO: 1 wt%); sintering flux 30wt% (one of the ratios is: SiO₂: 18.5wt%, ZnO: 1 wt%, B₂O₃: 10 wt%, Bi₂O₃: 0.5 wt%).
[0028] The specific implementation process is as follows: firstly, the sintering flux material needs to be smelted at 1300 ℃ after proportioning and mixing, and after quenching, the material is pulverized and ground to submicron powder. use.
[0029] Afte...
Embodiment 2
[0033] Embodiment 2: the present embodiment selects heavily doped P-type and N-type SiGe alloy semiconductor materials to make high-temperature thermoelectric semiconductor devices, and the conductive electrode material is selected from Cu-based materials; the main crystal phase material of ceramic film materials is selected from BaTiO₃; modified additives SiO₂, Al₂O₃, MgO, CaO; the sintering flux uses Nb₂O₅, ZnO, SnO₂, Bi₂O₃ to prepare relevant slurry; the ceramic slurry is based on 80wt% of the main crystal phase, 5wt% of the modification additive, and 15wt of the sintering flux % preparation.
[0034] The specific implementation process is as follows: firstly, the sintering flux material needs to be smelted at 1050 ℃ after proportioning and mixing, and after quenching, the material is pulverized and ground to sub-micron powder. use.
[0035] After the ceramic slurry is mixed according to the above ratio and ground to sub-micron particles, polymer organic binders and relate...
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